New approach for pattern collapse problem by increasing contact area at sub-100nm patterning

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 I, Issue , 2003, Pages 166-174

  Lee, Sung Koo ^a   Jung, Jae Chang ^a   Lee, Min Suk ^a   Lee, Sung Kwon ^a   Kim, Sam Young ^a   Hwang, Young Sun ^a   Bok, Cheolkyu ^a   Moon, Seung Chan ^a   Shin, Ki Soo ^a   Kim, San Jung ^b  

^a Hynix Semiconductor Inc   (South Korea)

^b Dongjin Semichem Co Ltd   (South Korea)

Author keywords

Adhesion; BARC; Capillary force; Contact area; Nano topology; Pattern collapse; Reflectivity; Sacrificial

Indexed keywords

ADHESION; COATINGS; ETCHING; NANOTECHNOLOGY; SUBSTRATES; SURFACE TENSION;

CAPILLARY FORCE; CONTACT AREA; NANOSCALE TOPOLOGY; PATTERN COLLAPSE;

PHOTOLITHOGRAPHY;

EID: 0141834819     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485052     Document Type: Conference Paper

References (4)

1. Kawaba, Satoshi, Tamai, Yukio, Omae, Shunkichi, Ohmi, Tadahiro, proc. SPIE, Vol. 3999, 717-725, 2000
2. S.Hien, G.Rich, G.Molina, H.B.Cao, P.F.Nealey, Proc. SPIE, Vol. 4690, 254-261, 2002
3. J.Simons, D.Goldfarb, M.Angelopoulos, S.Messick, W.Moreau, C.Robinson, J.De Pablo, P.Nealey, Proc. SPIE, Vol. 4345, 19-29, 2001
4. N.Hideo, Proc. SPIE, Vol. 4688, 888-895, 2002