Rinse liquid to improve pattern collapse behavior

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 II, Issue , 2003, Pages 1416-1424

  Lee, Geunsu ^a   Lee, Sung Koo ^a   Hwang, Young Sun ^a   Jung, Jae Chang ^a   Bok, Cheolkyu ^a   Moon, Seung Chan ^a   Shin, Ki Soo ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

ArF lithography; Pattern bending; Pattern collapse; Rinse; Surfactant

Indexed keywords

FIRST COLLAPSED CRITICAL DIMENSION; PATTERN BENDING; PATTERN COLLAPSE;

ANTIREFLECTION COATINGS; ASPECT RATIO; ELASTIC MODULI; HYDROPHILICITY; MASKS; ORGANIC SOLVENTS; SEMICONDUCTOR DEVICE MANUFACTURE; SOLUTIONS; SURFACE ACTIVE AGENTS; SURFACE TENSION;

PHOTORESISTS;

EID: 0141610864     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485175     Document Type: Conference Paper

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