Wafer sampling by regression for systematic wafer variation detection

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5755, Issue , 2005, Pages 212-221

  Moon, Byungsool ^a   McNames, James ^a   Whitefield, Bruce ^b   Rudolph, Paul ^b   Zola, Jeff ^b  

^a PORTLAND STATE UNIVERSITY   (United States)

^b AGERE SYSTEMS   (United States)

Author keywords

Cyclic coordinate method; Linear regression; Monte Carlo simulations; Principal components regression; QR decomposition; Singular value decomposition; Spatial variation; Systematic variation; Wafer modeling; Wafer sampling

Indexed keywords

CYCLIC COORDINATE METHOD; LINEAR REGRESSION; PRINCIPAL COMPONENT REGRESSION; QR DECOMPOSITION; SINGULAR VALUE DECOMPOSITION; SPATIAL VARIATION; SYSTEMATIC VARIATION; WAFER MODELING; WAFER SAMPLING;

COMPUTER SIMULATION; MEASUREMENT THEORY; MONTE CARLO METHODS; PROCESS CONTROL; STATISTICAL METHODS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 25144494082     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600217     Document Type: Conference Paper

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