Automated CD-SEM recipe creation - A new paradigm in CD-SEM utilization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6152 I, Issue , 2006, Pages

  Bunday, Benjamin ^a   Lipscomb, William ^a   Allgair, John ^a   Yang, Kyoungmo ^b   Koshihara, Shunsuke ^b   Morokuma, Hidetoshi ^b   Page, Lorena ^c   Danilevsky, Alex ^c  

^a SEMATECH   (United States)

^b HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

^c Hitachi High Technologies America   (United States)

Author keywords

Automatic Recipe Creation; CD SEM; DBM; Design based metrology; DesignGauge; DFM; Hitachi; ISMI; OPC; Optical Proximity Correction; SEMATECH

Indexed keywords

IMAGE PLACEMENT; LITHOGRAPHIC FIDELITY; OPTICAL PROXIMITY CORRECTION (OPC);

DATA REDUCTION; DISTANCE MEASUREMENT; IMAGE ANALYSIS; IMAGING SYSTEMS; LITHOGRAPHY; SCANNING ELECTRON MICROSCOPY;

OPTICAL SYSTEMS;

EID: 33745610022     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.659759     Document Type: Conference Paper

References (5)

1. "Use of Design Pattern Layout for Automatic Metrology Recipe Generation." C. Tabery (AMD); L. Page (Hitachi High Technologies) 5752-173, SPIE 2005
2. "A New Matching Engine Between Design Layout and SEM Image of Semiconductor Device." H. Morokuma, A. Sugiyama, Y. Toyoda, W. Nagatomo, T. Sutani, R. Matsuoka (Hitachi High Technologies) 5752-53, SPIE 2005
3. Benjamin Bunday, Amir Azordegan, Andras Vladar, Bhanwar Singh, Bill Banke, Garsten Hartig, Chas Archie, David Joy, Eric Solecky, Gary Cao, John Villarrubia, Michael Postek. "Unified Advanced Critical Dimension Scanning Electron Microscope (CD-SEM) Specification for sub-90 nm Technology (2005 Version)". ISMI Tech Transfer document ID# 04114595B-ENG, Dec 2005. Non-confidential, available on SEMATECH website, http://www.sematech.org.
4. Bunday, B., Peterson, A., and Allgair, J. "Specifications, Methodologies and Results of Evaluation of Optical Critical Dimension Scatterometer Tools at the 90nm CMOS Technology Node and Beyond". Procedings of SPIE 2005, v5752, pp 304-323.
5. Bunday, B., Allgair, J., and Bishop, M. "Results of Benchmarking of Advanced Critical Dimension Scanning Electron Microscopes (CD-SEMs) at the 90 nm CMOS Technology Node". Proceedings of the SPIE: Metrology, Inspection, and Process Control for Microlithography XVIII (2004), 151-172.