Usage of profile information obtained with Scatterometry

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue II, 2005, Pages 736-743

  Koike, Toni ^a   Asano, Masafumi ^a   Mikami, Toru ^a   Yamazaki, Yuichiro ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

CD; CD SEM; Dose; Focus; Library; Model; Photoresist profile; Scatterometry; Sidewall Angle

Indexed keywords

ATOMIC FORCE MICROSCOPY; INFORMATION ANALYSIS; MATHEMATICAL MODELS; MEASUREMENT THEORY; NONDESTRUCTIVE EXAMINATION; OPTIMIZATION; PHOTORESISTS; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY;

CD; CD-SEM; DOSE; LIBRARY; PHOTORESIST PROFILES; SCATTEROMETRY; SIDEWALL ANGLES;

OPTICAL DEVICES;

EID: 24644432593     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600325     Document Type: Conference Paper

References (8)

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