In-line lithography cluster monitoring and control using integrated scatterometry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5378, Issue , 2004, Pages 105-115

  Pollentier, Ivan ^a   Cheng, Shaunee Y ^a   Baudemprez, Bart ^a   Laidler, David ^a   Van Dommelen, Youri ^b   Carpaij, Rene ^b   Yu, Jackie ^c   Uchida, Junichi ^c   Viswanathan, Anita ^c   Chin, Doris ^c   Barry, Kelly ^c   Jakatdar, Nickhil ^c  

^a IMEC   (Belgium)

^b ASML   (Netherlands)

^c TOKYO ELECTRON LTD   (Japan)

Author keywords

APC; CD control; Integrated metrology; Scatterometry

Indexed keywords

MATHEMATICAL MODELS; MEASUREMENT THEORY; MICROPROCESSOR CHIPS; PRECISION ENGINEERING; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY;

APC; CD CONTROL; CRITICAL DIMENSIONS (CD); INTEGRATED METROLOGY; SCATTEROMETRY;

LITHOGRAPHY;

EID: 2942670510     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537384     Document Type: Conference Paper

References (5)

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3. Xinhui Niu, Nickhil Jakatdar, Junwei Bo, Costas J. Spanos, Sanjay K. Yedur, "Specular Spectroscopic Sctterometry in DUV lithography", Proc. SPIE, Vol. 3677, p. 159-168, June 1999.
4. J. van Schoot, O. Noordman, P. Vanoppen, F. Blok, D. Yim, C-H. Park, B-H. Cho, T. Theeuwes, and Y-H. Min, "CD uniformity improvement by Active Scanner correction", Proceedings SPIE, vol. 4691, p.304-314 (2002)
5. J. Yu, J. Uchida, Y. van Dommelen, R. Carpaij, S. Cheng, I. Pollentier, A. Viswanathan, L. Lane, K. Barry, and N. Jakatdar, "Characterization of the Integrated Optical CD for the Process Control", Proceedings SPIE Vol. 5375 (2004)