Run-to-run CD error analysis and control with monitoring of effective dose and focus

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 239-246

  Asano, Masafumi ^a   Fujisawa, Tadahito ^a   Izuha, Kyoko ^a   Inoue, Soichi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

CD control; Effective dose; Effective focus; Monitor; Run to run

Indexed keywords

ERROR ANALYSIS; FOCUSING; MEASUREMENT ERRORS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS;

CRITICAL DIMENSION ERROR; EFFECTIVE DOSE; EFFECTIVE FOCUS;

LITHOGRAPHY;

EID: 0141723682     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482807     Document Type: Conference Paper

References (6)

1. C. P. Ausschnitt, C. J. Progler, and W. Chu, "CD control of low k-factor step-and-scan lithography," Proc. SPIE 4346, pp. 293-302, 2001.
2. M. Asano, K. Izuha, T. Fujisawa, and S. Inoue, "CD control with effective exposure dose monitor technique", Proc. SPIE 4691, pp. 280-287, 2002.
3. T. A. Brunner, A. L. Martin, R. M. Martino, C. P. Ausschnitt, and T. G. Newman, "Quantitative stepper metrology using the focus monitor test mask", Proc. SPIE 2197, pp. 541-549, 1994.
4. H. Nomura, "Accurate measurement of spherical and astigmatic aberrations by a phase shift grating reticle", Jpn. J Appl. Phys. 40, pp. 6316-6322, 2001.
5. K. Izuha, M. Asano, T. Fujisawa, and S. Inoue, "Novel in-situ focus monitor technology in attenuated PSM under actual illumination condition", to be published in Proc. SPIE 5040, 2003.
6. A. Starikov, "Exposure monitor structure", Proc. SPIE 1261, pp. 315-324, 1990.