Advanced process control for polysilicon gate etching using integrated optical CD metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5044, Issue , 2003, Pages 90-96

  Kota, Gowri P ^a   Lugue, Jorge ^a   Vahedi, Vahid ^a   Khathuria, Ashok ^b   Dziura, Ted ^c   Levy, Ady ^c  

^a LAM RESEARCH CORPORATION   (United States)

^b ADVANCED MICRO DEVICES   (United States)

^c KLA TENCOR CORPORATION   (United States)

Author keywords

APC; Etch; Integrated metrology; Process control; Scatterometry

Indexed keywords

ACTUATORS; ETCHING; FEEDBACK CONTROL; PHOTOLITHOGRAPHY; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICES;

CRITICAL DIMENSION (CD); INTEGRATED METROLOGY;

POLYSILICON;

EID: 0242441473     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.487635     Document Type: Conference Paper

References (4)

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4. C. El-Chemali, J.S. Freudenberg, M. Hankinson, W. Collision, T. Ni, Submitted to J. Vac. Sci. Technol.