Chemically selective soft X-ray patterning of polymers

Journal of Synchrotron Radiation

Volumn 14, Issue 2, 2007, Pages 181-190

  Wang, Jian ^a   Stöver, Harald D H ^a   Hitchcock, Adam P ^a   Tyliszczak, Tolek ^b  

^a MCMASTER UNIVERSITY   (Canada)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

C 1s NEXAFS; Chemically selective; Lithography; PAN; PECA; PMMA; Radiation damage; Soft X ray

Indexed keywords

IRRADIATION; POLYACRYLONITRILES; POLYMER FILMS; RADIATION DAMAGE; SCANNING ELECTRON MICROSCOPY; X RAY ANALYSIS;

C 1S NEXAFS; CHEMICALLY SELECTIVE MODIFICATION; MULTI-WAVELENGTH PATTERNS; SOFT X-RAY;

POLYMETHYL METHACRYLATES;

EID: 33847741075     PISSN: 09090495     EISSN: 16005775     Source Type: Journal    
DOI: 10.1107/S0909049506053829     Document Type: Article

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