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Volumn 101, Issue 2, 2007, Pages

Theoretical analysis of current-driven interactions between voids in metallic thin films

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC MATERIALS; ELECTROMIGRATION TESTING; METALLIC INTERCONNECT LINES; METALLIC THIN FILMS;

EID: 33847735488     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2426901     Document Type: Article
Times cited : (13)

References (26)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.