Atomic layer deposition of PbZrO 3 thin films

Applied Surface Science

Volumn 253, Issue 12, 2007, Pages 5228-5232

  Harjuoja, Jenni ^a   Väyrynen, Samuli ^b   Putkonen, Matti ^a   Niinistö, Lauri ^a   Rauhala, Eero ^b  

^a AALTO UNIVERSITY   (Finland)

^b UNIVERSITY OF HELSINKI   (Finland)

Author keywords

ALD; Atomic force microscopy; Atomic layer deposition; Lead zirconate; Rutherford backscattering spectroscopy; X ray diffraction

Indexed keywords

ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; FILM GROWTH; LEAD COMPOUNDS; OZONE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; STOICHIOMETRY; X RAY DIFFRACTION;

LEAD ZIRCONATE; LEAD ZIRCONATE FILMS; OXYGEN SOURCE; PULSING RATIOS;

THIN FILMS;

EID: 33847651762     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.11.041     Document Type: Article

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