Utilizing self-assembled multilayers in lithographic processing for nanostructure fabrication: Initial evaluation of the electrical integrity of nanogaps

Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 248-252

  Anderson, M E ^a   Srinivasan, Charan ^b   Jayaraman, Raviprakesh ^b   Weiss, P S ^a   Horn, M W ^b  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b The Pennsylvania State University   (United States)

Author keywords

Molecular rulers; Nanolithography; Nonogaps; Self assembled multilayers

Indexed keywords

LSI CIRCUITS; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLY;

METAL DEPOSITION; MOLECULAR RULERS; NONOGAPS; SELF ASSEMBLED MULTILAYERS;

MULTILAYERS;

EID: 14944339255     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.01.003     Document Type: Conference Paper

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