Hybrid approaches to nanolithography: Photolithographic structures with precise, controllable nanometer-scale spacings created by molecular rulers

Advanced Materials

Volumn 18, Issue 8, 2006, Pages 1020-1022

  Anderson, Mary E ^a   Mihok, Morgan ^a   Tanaka, Hirofumi ^a,c   Tan, Lim Piu ^b   Horn, Mark W ^b   McCarty, Gregory S ^b,d   Weiss, Paul S ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b The Pennsylvania State University   (United States)

^c INSTITUTE FOR MOLECULAR SCIENCE   (Japan)

^d NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; INTERFACES (MATERIALS); MOLECULAR DYNAMICS; PHOTOLITHOGRAPHY; SELF ASSEMBLY;

MOLECULAR RULERS; NANOMETER-SCALE SPACINGS; PARALLEL HYBRID METHODOLOGIES;

NANOTECHNOLOGY;

EID: 33646563724     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200600108     Document Type: Article

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