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Volumn 53, Issue 6, 2006, Pages 3349-3355

Variability in FG memories performance after irradiation

Author keywords

Floating gate (FG) memories; Radiation induced leakage current (RILC); Single event effects

Indexed keywords

FLOATING GATE (FG); LINEAR ENERGY TRANSFER (LET); SINGLE EVENT EFFECTS; STRESS INDUCED LEAKAGE CURRENT (SILC); TUNNEL OXIDE;

EID: 33846283779     PISSN: 00189499     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNS.2006.886766     Document Type: Conference Paper
Times cited : (16)

References (32)
  • 2
    • 0022865689 scopus 로고
    • The relationship between 60Co and 10 keV X-ray damage in MOS devices
    • J. M. Benedetto and H. E. Boesch, "The relationship between 60Co and 10 keV X-ray damage in MOS devices," IEEE Trans. Nucl. Sci., vol. 33, p. 131, 1986.
    • (1986) IEEE Trans. Nucl. Sci , vol.33 , pp. 131
    • Benedetto, J.M.1    Boesch, H.E.2
  • 4
    • 36149016302 scopus 로고
    • Initial recombination of ions
    • L. Osanger, "Initial recombination of ions," Phys. Rev., vol. 54, p. 554, 1938.
    • (1938) Phys. Rev , vol.54 , pp. 554
    • Osanger, L.1
  • 6
    • 0024913722 scopus 로고
    • The nature of the trapped hole annealing process
    • Dec
    • A. J. Lelis, T. R. Oldham, H. E. Boesch, Jr., and F. B. McLean, "The nature of the trapped hole annealing process," IEEE Trans. Nucl. Sci., vol. 36, no. 6, pp. 1808-1815, Dec. 1989.
    • (1989) IEEE Trans. Nucl. Sci , vol.36 , Issue.6 , pp. 1808-1815
    • Lelis, A.J.1    Oldham, T.R.2    Boesch Jr., H.E.3    McLean, F.B.4
  • 8
    • 0032306849 scopus 로고    scopus 로고
    • Radiation-induced leakage current and stress induced leakage current in ultra-thin gate oxides
    • Dec
    • M. Ceschia, A. Paccagnella, A. Cester, A. Scarpa, and G. Ghidini, "Radiation-induced leakage current and stress induced leakage current in ultra-thin gate oxides," IEEE Trans. Nucl. Sci., vol. 45, no. 6, pp. 2375-2382, Dec. 1998.
    • (1998) IEEE Trans. Nucl. Sci , vol.45 , Issue.6 , pp. 2375-2382
    • Ceschia, M.1    Paccagnella, A.2    Cester, A.3    Scarpa, A.4    Ghidini, G.5
  • 9
    • 0033080327 scopus 로고    scopus 로고
    • A new I-V model for stress-induced leakage current including inelastic tunneling
    • S.-I. Takagi, N. Yasuda, and A. Toriumi, "A new I-V model for stress-induced leakage current including inelastic tunneling," IEEE Trans. Electron Devices, vol. 46, no. 2, pp. 348-354, 1999.
    • (1999) IEEE Trans. Electron Devices , vol.46 , Issue.2 , pp. 348-354
    • Takagi, S.-I.1    Yasuda, N.2    Toriumi, A.3
  • 10
    • 0035723155 scopus 로고    scopus 로고
    • A new physics-based model for understanding single event gate rupture in linear devices
    • Dec
    • N. Boruta, G. K. Lum, H. O'Donnell, L. Robinette, M. R. Shaneyfelt, and J. R. Schwank, "A new physics-based model for understanding single event gate rupture in linear devices," IEEE Trans. Nucl. Sci., vol. 48, no. 6, pp. 1917-1934, Dec. 2001.
    • (2001) IEEE Trans. Nucl. Sci , vol.48 , Issue.6 , pp. 1917-1934
    • Boruta, N.1    Lum, G.K.2    O'Donnell, H.3    Robinette, L.4    Shaneyfelt, M.R.5    Schwank, J.R.6
  • 14
    • 1242265231 scopus 로고    scopus 로고
    • Data retention after heavy ion exposure of Floating Gate memories: Analysis and simulation
    • Dec
    • L. Larcher, G. Cellere, A. Paccagnella, A. Chimenton, A. Candelori, and A. Modelli, "Data retention after heavy ion exposure of Floating Gate memories: analysis and simulation," IEEE Trans. Nucl. Sci., vol. 50, no. 6, pp. 2176-2183, Dec. 2003.
    • (2003) IEEE Trans. Nucl. Sci , vol.50 , Issue.6 , pp. 2176-2183
    • Larcher, L.1    Cellere, G.2    Paccagnella, A.3    Chimenton, A.4    Candelori, A.5    Modelli, A.6
  • 17
    • 11044226028 scopus 로고    scopus 로고
    • Transient conductive path induced by a single ion in 10 nm SiO2 layers
    • Dec
    • G. Cellere, A. Paccagnella, A. Visconti, M. Bonanomi, and A. Candelori, "Transient conductive path induced by a single ion in 10 nm SiO2 layers," IEEE Trans. Nucl. Sci., vol. 6, no. 49, pp. 3304-3311, Dec. 2004.
    • (2004) IEEE Trans. Nucl. Sci , vol.6 , Issue.49 , pp. 3304-3311
    • Cellere, G.1    Paccagnella, A.2    Visconti, A.3    Bonanomi, M.4    Candelori, A.5
  • 18
    • 33645940598 scopus 로고    scopus 로고
    • Subpicosecond conduction through thin SiO2 layers triggered by heavy ions
    • G. Cellere, A. Paccagnella, A. Visconti, and M. Bonanomi, "Subpicosecond conduction through thin SiO2 layers triggered by heavy ions," J. Appl. Phys., vol. 99, p. 074101, 2006.
    • (2006) J. Appl. Phys , vol.99 , pp. 074101
    • Cellere, G.1    Paccagnella, A.2    Visconti, A.3    Bonanomi, M.4
  • 19
    • 0032275853 scopus 로고    scopus 로고
    • Reliability projection for ultra-thin oxides at low voltage
    • J. H. Stathis and D. J. DiMaria, "Reliability projection for ultra-thin oxides at low voltage," in Proc. 1998 IEDM Tech. Digest, pp. 167-170.
    • Proc. 1998 IEDM Tech. Digest , pp. 167-170
    • Stathis, J.H.1    DiMaria, D.J.2
  • 22
    • 0033733540 scopus 로고    scopus 로고
    • Field acceleration for oxide breakdown - can an accurate anode hole injection model resolve the E vs. 1/E controversy?
    • M. A. Alam, J. Bude, and A. Ghetti, "Field acceleration for oxide breakdown - can an accurate anode hole injection model resolve the E vs. 1/E controversy?," in Proc. 2000 Int. Rel. Phys. Symp. (IRPS), pp. 21-26.
    • Proc. 2000 Int. Rel. Phys. Symp. (IRPS) , pp. 21-26
    • Alam, M.A.1    Bude, J.2    Ghetti, A.3
  • 23
    • 0021599338 scopus 로고
    • Radiation effects in MOS capacitors with very thin oxides at 80 K
    • Dec
    • N. S. Saks, M. G. Ancona, and J. A. Modolo, "Radiation effects in MOS capacitors with very thin oxides at 80 K," IEEE Trans. Nucl. Sci., vol. 31, no. 6, pp. 1249-1255, Dec. 1984.
    • (1984) IEEE Trans. Nucl. Sci , vol.31 , Issue.6 , pp. 1249-1255
    • Saks, N.S.1    Ancona, M.G.2    Modolo, J.A.3
  • 29
    • 0030169875 scopus 로고    scopus 로고
    • Fast and slow border traps in MOS devices
    • Jun
    • D. M. Fleetwood, "Fast and slow border traps in MOS devices," IEEE Trans. Nucl. Sci., vol. 43, no. 3, pp. 779-786, Jun. 1996.
    • (1996) IEEE Trans. Nucl. Sci , vol.43 , Issue.3 , pp. 779-786
    • Fleetwood, D.M.1
  • 30
    • 0031212918 scopus 로고    scopus 로고
    • Flash memory cells - an overview
    • Aug
    • P. Pavan, R. Bez, P. Olivo, and E. Zanoni, "Flash memory cells - an overview," Proc. IEEE, vol. 85, no. 8, pp. 1248-1271, Aug. 1997.
    • (1997) Proc. IEEE , vol.85 , Issue.8 , pp. 1248-1271
    • Pavan, P.1    Bez, R.2    Olivo, P.3    Zanoni, E.4
  • 31
    • 0000402688 scopus 로고    scopus 로고
    • Non-Gaussian behavior and anticorrelations in ultrathin gate oxides after soft breakdown
    • Mar
    • N. Vandewalle, M. Ausloos, M. Houssa, P. W. Mertens, and M. M. Heyns, "Non-Gaussian behavior and anticorrelations in ultrathin gate oxides after soft breakdown," Appl. Phys. Lett., vol. 74, no. 11, pp. 1579-1581, Mar. 1999.
    • (1999) Appl. Phys. Lett , vol.74 , Issue.11 , pp. 1579-1581
    • Vandewalle, N.1    Ausloos, M.2    Houssa, M.3    Mertens, P.W.4    Heyns, M.M.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.