Influence of the deposition parameters on the electronic and structural properties of pulsed laser ablation prepared Si1-x Cx thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 1, 2007, Pages 117-125

  Neri, F ^a   Barreca, F ^a   Fazio, E ^a   Barletta, E ^a   Mondio, G ^a   Trusso, S ^b   Brendebach, B ^c   Modrow, H ^c  

^a UNIVERSITY OF MESSINA   (Italy)

^b CNR   (Italy)

^c UNIVERSITY OF BONN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAPHITE; PULSED LASER DEPOSITION; STRUCTURAL ANALYSIS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSITION PARAMETERS; STRUCTURAL PROPERTIES; X-RAY ABSORPTION NEAR EDGE STRUCTURE SPECTROSCOPIES;

LASER ABLATION;

EID: 33846226530     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2400685     Document Type: Article

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