SCOPUS 정보 검색 플랫폼 - 논문 보기

메뉴 건너뛰기

Thin Solid Films

Volumn 346, Issue 1, 1999, Pages 155-161

Effects of substrate temperature on the properties of tetrahedral amorphous carbon films

(5) Tay, B K a Shi, X a Liu, E J a Tan, H S a Cheah, L K a

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; COMPRESSIVE STRESS; DEPOSITION; RAMAN SPECTROSCOPY; SUBSTRATES; SURFACE ROUGHNESS; THERMAL EFFECTS;

AMORPHOUS CARBON FILMS; DEPOSITION TEMPERATURE; VACUUM ARC DEPOSITION;

AMORPHOUS FILMS;

EID: 0033149420 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(98)01756-8 Document Type: Article

Times cited : (26)

References (28)

1
- 0023999857
- P.J. Martin, S.W. Filipczuk, R.P. Netterfield, J.S. Field, D.F. Whitnall, D.R. McKenzie, J. Mater. Sci. Lett. 7 (1988) 410.
- (1988) J. Mater. Sci. Lett. , vol.7 , pp. 410
- Martin, P.J.¹ Filipczuk, S.W.² Netterfield, R.P.³ Field, J.S.⁴ Whitnall, D.F.⁵ McKenzie, D.R.⁶

2
- 0026360642
- P.J. Martin, R.P. Netterfield, T.J. Kinder, L. Descotes, Surf Coat. Technol. 49 (1991) 239.
- (1991) Surf Coat. Technol. , vol.49 , pp. 239
- Martin, P.J.¹ Netterfield, R.P.² Kinder, T.J.³ Descotes, L.⁴

3
- 0010005593
- D.R. McKenzie, D. Muller, B.A. Pailthorpe, Phys. Rev. Lett. 67 (1991) 773.
- (1991) Phys. Rev. Lett. , vol.67 , pp. 773
- McKenzie, D.R.¹ Muller, D.² Pailthorpe, B.A.³

4
- 0027871975
- S. Falabella, D.B. Boercker, D.M. Sanders, Thin Film Solids 236 (1993) 82.
- (1993) Thin Film Solids , vol.236 , pp. 82
- Falabella, S.¹ Boercker, D.B.² Sanders, D.M.³

5
- 0000879286
- P.J. Fallon, V.S. Veerasamy, C.A. Davis, J. Robertson, G.A.J. Amaratunga, W.I. Milne, J. Koskinen, Phys. Rev. B 48 (1993) 4777.
- (1993) Phys. Rev. B , vol.48 , pp. 4777
- Fallon, P.J.¹ Veerasamy, V.S.² Davis, C.A.³ Robertson, J.⁴ Amaratunga, G.A.J.⁵ Milne, W.I.⁶ Koskinen, J.⁷

6
- 0006413423
- X. Shi, B.K. Tay, H.S. Tan, L. Zhong, Y.Q. Tu, S.R.P. Silva, W.I. Milne, J. Appl. Phys. 79 (9) (1996) 7239.
- (1996) J. Appl. Phys. , vol.79 , Issue.9 , pp. 7239
- Shi, X.¹ Tay, B.K.² Tan, H.S.³ Zhong, L.⁴ Tu, Y.Q.⁵ Silva, S.R.P.⁶ Milne, W.I.⁷

7
- 0028413474
- Y. Lifshitz, G.D. Lempert, S. Rotter, Diam. Rel. Mater. 3 (1994) 542.
- (1994) Diam. Rel. Mater. , vol.3 , pp. 542
- Lifshitz, Y.¹ Lempert, G.D.² Rotter, S.³

8
- 0000981216
- R. Lossy, D.L. Pappas, R.A. Roy, J.P. Doyle, J.J. Cuomo, J. Bruely, J. Appl. Phys. 77 (1995) 4750.
- (1995) J. Appl. Phys. , vol.77 , pp. 4750
- Lossy, R.¹ Pappas, D.L.² Roy, R.A.³ Doyle, J.P.⁴ Cuomo, J.J.⁵ Bruely, J.⁶

9
- 0001356099
- G.M. Pharr, D.L. Callahan, S.D. Mcadams, T.Y. Tsui, S. Anders, A. Anders, J.W. Ager, I.G. Brown, C. Singh, S.R.P. Silva, J. Robertson, Appl. Phys. Lett. 68 (1996) 779.
- (1996) Appl. Phys. Lett. , vol.68 , pp. 779
- Pharr, G.M.¹ Callahan, D.L.² Mcadams, S.D.³ Tsui, T.Y.⁴ Anders, S.⁵ Anders, A.⁶ Ager, J.W.⁷ Brown, I.G.⁸ Singh, C.⁹ Silva, S.R.P.¹⁰ Robertson, J.¹¹

10
- 0000648081
- Y. Lifshitz, Diam. Rel. Mater. 5 (1996) 388.
- (1996) Diam. Rel. Mater. , vol.5 , pp. 388
- Lifshitz, Y.¹

11
- 0030421338
- S.R.P. Silva, Xu. Shi, B.K. Tay, H.S. Tan, H.J. Scheibe, M. Chhowalla, W.I. Milne, Thin Solid Films 290-291 (1996) 317.
- (1996) Thin Solid Films , vol.290-291 , pp. 317
- Silva, S.R.P.¹ Shi, Xu.² Tay, B.K.³ Tan, H.S.⁴ Scheibe, H.J.⁵ Chhowalla, M.⁶ Milne, W.I.⁷

12
- 0347307270
- B.K. Tay, X. Shi, L.K. Cheah, D.I. Flynn, Thin Solid Films 308-309 (1997) 199.
- (1997) Thin Solid Films , vol.308-309 , pp. 199
- Tay, B.K.¹ Shi, X.² Cheah, L.K.³ Flynn, D.I.⁴

13
- 0009355065
- D. Flynn, Xu. Shi, B.K. Tay, S. Prawer, K.W. Nugent, S.R.P. Silva, Y. Lifshitz, W.I. Milne, Phil. Mag. B. 76 (3) (1997) 351.
- (1997) Phil. Mag. B. , vol.76 , Issue.3 , pp. 351
- Flynn, D.¹ Shi, Xu.² Tay, B.K.³ Prawer, S.⁴ Nugent, K.W.⁵ Silva, S.R.P.⁶ Lifshitz, Y.⁷ Milne, W.I.⁸

14
- 0009460290
- H.J. Schiebe, B. Shultrich, Thin Solid Films 246 (1994) 92.
- (1994) Thin Solid Films , vol.246 , pp. 92
- Schiebe, H.J.¹ Shultrich, B.²

15
- 33751369717
- S. Sattel, T. Giessen, H. Roth, M. Scheib, R. Ramienski, R. Brenn, H. Ehrhardt, J. Robertson, Diam. Rel. Mater. 4 (1995) 333.
- (1995) Diam. Rel. Mater. , vol.4 , pp. 333
- Sattel, S.¹ Giessen, T.² Roth, H.³ Scheib, M.⁴ Ramienski, R.⁵ Brenn, R.⁶ Ehrhardt, H.⁷ Robertson, J.⁸

16
- 0000560715
- M. Chhowalla, J. Robertson, C.W. Chen, S.R.P. Silva, C.A. Davis, G.A.J. Amaratunga, W.I. Milne, J. Appl. Phys. 81 (1) (1997) 139.
- (1997) J. Appl. Phys. , vol.81 , Issue.1 , pp. 139
- Chhowalla, M.¹ Robertson, J.² Chen, C.W.³ Silva, S.R.P.⁴ Davis, C.A.⁵ Amaratunga, G.A.J.⁶ Milne, W.I.⁷

17
- 0003615639
- PCT/GB96/00389, 20th February
- X. Shi, D. Flynn, B.K. Tay, H.S. Tan, Filtered Cathodic Arc Source, PCT/GB96/00389, 20th February, 1995.
- (1995) Filtered Cathodic Arc Source
- Shi, X.¹ Flynn, D.² Tay, B.K.³ Tan, H.S.⁴

18
- 0004245224
- PCT/ GB96/00390, 20th February
- X. Shi, M. Fulton, D. Flynn, H.S. Tan, Deposition Apparatus, PCT/ GB96/00390, 20th February, 1995.
- (1995) Deposition Apparatus
- Shi, X.¹ Fulton, M.² Flynn, D.³ Tan, H.S.⁴

19
- 0000073841
- G.G. Stoney, Proc. R. Soc. Lond. 82 (1909) 172.
- (1909) Proc. R. Soc. Lond. , vol.82 , pp. 172
- Stoney, G.G.¹

20
- 0014829099
- F. Tuinstra, J.L. Koenig, J. Chem. Phys. 53 (3) (1970) 1126.
- (1970) J. Chem. Phys. , vol.53 , Issue.3 , pp. 1126
- Tuinstra, F.¹ Koenig, J.L.²

21
- 0001181304
- J. Schwan, S. Ulrich, V. Batori, H. Ehrhardt, S.R.P. Silva, J. Appl. Phys. 80 (1) (1996) 440.
- (1996) J. Appl. Phys. , vol.80 , Issue.1 , pp. 440
- Schwan, J.¹ Ulrich, S.² Batori, V.³ Ehrhardt, H.⁴ Silva, S.R.P.⁵

22
- 36549103143
- M. Yoshikawa, G. Katagiri, H. Ishida, A. Ishitani, T. Akamatsu, J. Appl. Phys. 64 (11) (1988) 6464.
- (1988) J. Appl. Phys. , vol.64 , Issue.11 , pp. 6464
- Yoshikawa, M.¹ Katagiri, G.² Ishida, H.³ Ishitani, A.⁴ Akamatsu, T.⁵

23
- 0028513408
- M.A. Tamor, W.C. Vassell, J. Appl. Phys. 76 (6) (1994) 3823.
- (1994) J. Appl. Phys. , vol.76 , Issue.6 , pp. 3823
- Tamor, M.A.¹ Vassell, W.C.²

24
- 0032486037
- B.K. Tay, X. Shi, H.S. Tan, H.S. Yang, Z. Sun, Surf. Coat. Technol. 105 (1998) 155.
- (1998) Surf. Coat. Technol. , vol.105 , pp. 155
- Tay, B.K.¹ Shi, X.² Tan, H.S.³ Yang, H.S.⁴ Sun, Z.⁵

25
- 85031629769
- in press
- Qing Zhang, S.F. Yoon, R.J. Ahn, H. Yang, D. Bahr, J. Appl. Phys., 84(10), in press.
- J. Appl. Phys. , vol.84 , Issue.10
- Zhang, Q.¹ Yoon, S.F.² Ahn, R.J.³ Yang, H.⁴ Bahr, D.⁵

26
- 85031635688
- Sydney, Australia, July 27-29
- B.K. Tay, X. Shi, The 4th Asia-Pacific Conference on Plasma Science & Technology, Sydney, Australia, July 27-29, 1998.
- (1998) The 4th Asia-Pacific Conference on Plasma Science & Technology
- Tay, B.K.¹ Shi, X.²

27
- 4243363393
- D. Beeman, J. Silverman, R. Lynds, M.R. Anderson, Phys. Rev. B 30 (1984) 870.
- (1984) Phys. Rev. B , vol.30 , pp. 870
- Beeman, D.¹ Silverman, J.² Lynds, R.³ Anderson, M.R.⁴

28
- 0023040419
- A. Richter, H.J. Scheibe, W. Pompe, K.W. Brzeinka, I. Muhling, J. Non-Cryst. Solids 88 (1986) 131.
- (1986) J. Non-Cryst. Solids , vol.88 , pp. 131
- Richter, A.¹ Scheibe, H.J.² Pompe, W.³ Brzeinka, K.W.⁴ Muhling, I.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.