-
1
-
-
0001873370
-
Mirror systems with glancing incidence as image-producing optics for x-rays
-
H. Wolter, "Mirror systems with glancing incidence as image-producing optics for x-rays," Ann. Phys. 10, 94-114 (1952).
-
(1952)
Ann. Phys
, vol.10
, pp. 94-114
-
-
Wolter, H.1
-
2
-
-
0042635950
-
Grazing incidence telescopes for x-ray astronomy
-
R. Giacconi, W. P. Reidy, G. S. Vaiana, L. P. VanSpeybroeck, and T. Zehnpfennig, "Grazing incidence telescopes for x-ray astronomy," Space Sci. Rev. 9, 3-57 (1969).
-
(1969)
Space Sci. Rev
, vol.9
, pp. 3-57
-
-
Giacconi, R.1
Reidy, W.P.2
Vaiana, G.S.3
VanSpeybroeck, L.P.4
Zehnpfennig, T.5
-
3
-
-
0015300239
-
Design parameters of paraboloid-hyperboloid telescopes for x-ray astronomy
-
L. P. VanSpeybroeck and R. C. Chase, "Design parameters of paraboloid-hyperboloid telescopes for x-ray astronomy," Appl. Opt. 11, 440-448 (1972).
-
(1972)
Appl. Opt
, vol.11
, pp. 440-448
-
-
VanSpeybroeck, L.P.1
Chase, R.C.2
-
4
-
-
0028736255
-
The XMM mission
-
Ph. Gondoin, D. de Chambure, K. van Katwijk, Ph. Kletzine, and D. Stramaccioni, A. Aschenbach, O. Citterio, and R. Willingale, "The XMM mission," in Proc. SPIE 2279, 86-100 (1994).
-
(1994)
Proc. SPIE
, vol.2279
, pp. 86-100
-
-
Gondoin, P.1
de Chambure, D.2
van Katwijk, K.3
Kletzine, P.4
Stramaccioni, D.5
Aschenbach, A.6
Citterio, O.7
Willingale, R.8
-
5
-
-
0033713005
-
Chandra X-ray Observatory (CXO): Overview
-
M. C. Weisskopf, H. D. Tananbaum, V. Speybroeck, and S. L. O'Dell, "Chandra X-ray Observatory (CXO): overview," in Proc SPIE 4012, 2-16 (2000).
-
(2000)
Proc SPIE
, vol.4012
, pp. 2-16
-
-
Weisskopf, M.C.1
Tananbaum, H.D.2
Speybroeck, V.3
O'Dell, S.L.4
-
6
-
-
6044239653
-
The SWIFT gamma ray burst mission
-
N. Gehrels, G. Chincarini, P. Giommi, K. O. Mason, J. A. Nousek, A. A. Wells, N. E. White, S. D. Barthelmy, D. N. Burrows, L. R. Cominsky, K. C. Hurley, F. E. Marshall, P. Meszaros, and P. W. A. Roming, "The SWIFT gamma ray burst mission," Astrophys. J. 611, 1005-1020 (2004).
-
(2004)
Astrophys. J
, vol.611
, pp. 1005-1020
-
-
Gehrels, N.1
Chincarini, G.2
Giommi, P.3
Mason, K.O.4
Nousek, J.A.5
Wells, A.A.6
White, N.E.7
Barthelmy, S.D.8
Burrows, D.N.9
Cominsky, L.R.10
Hurley, K.C.11
Marshall, F.E.12
Meszaros, P.13
Roming, P.W.A.14
-
7
-
-
84975646169
-
Design, construction, and performance of the ROSAT high resolution mirror assembly
-
B. Aschenbach, "Design, construction, and performance of the ROSAT high resolution mirror assembly," Appl. Opt. 27, 1404-1413 (1988).
-
(1988)
Appl. Opt
, vol.27
, pp. 1404-1413
-
-
Aschenbach, B.1
-
8
-
-
11144354167
-
SYMBOL-X: A new generation hard x-ray telescope
-
P. Ferrando, M. Arnaud, B. Cordier, A. Goldwurm, O. Limousin, J. Paul, J. L. Sauvageot, P. O. Petrucci, M. Mouchet, G. F. Bignami, O. Citterio, S. Campana, G. Pareschi, G. Tagliaferri, U. G. Briel, G. Hasinger, L. Strueder, P. Lechner, E. Kendziorra, and M. J. Turner, "SYMBOL-X: a new generation hard x-ray telescope," in Proc. SPIE 5165, 65-76 (2004).
-
(2004)
Proc. SPIE
, vol.5165
, pp. 65-76
-
-
Ferrando, P.1
Arnaud, M.2
Cordier, B.3
Goldwurm, A.4
Limousin, O.5
Paul, J.6
Sauvageot, J.L.7
Petrucci, P.O.8
Mouchet, M.9
Bignami, G.F.10
Citterio, O.11
Campana, S.12
Pareschi, G.13
Tagliaferri, G.14
Briel, U.G.15
Hasinger, G.16
Strueder, L.17
Lechner, P.18
Kendziorra, E.19
Turner, M.J.20
more..
-
9
-
-
1842689676
-
Soft (0.1-10 keV) and hard (>10 keV) x-ray multilayer mirrors for the XEUS astronomical mission
-
G. Pareschi and V. Cotroneo, "Soft (0.1-10 keV) and hard (>10 keV) x-ray multilayer mirrors for the XEUS astronomical mission," in Proc. SPIE 5168, 53-64 (2004).
-
(2004)
Proc. SPIE
, vol.5168
, pp. 53-64
-
-
Pareschi, G.1
Cotroneo, V.2
-
10
-
-
10044233023
-
Constellation x-ray mission: Recent developments for mission concept and technology development
-
H. Tananbaum, N. E. White, K. Weaver, and R. Petre, "Constellation x-ray mission: recent developments for mission concept and technology development," in Proc. SPIE 5488, 492-504 (2004).
-
(2004)
Proc. SPIE
, vol.5488
, pp. 492-504
-
-
Tananbaum, H.1
White, N.E.2
Weaver, K.3
Petre, R.4
-
11
-
-
60049098657
-
Beiträge zur Theorie des Mikroskops und der Mikroskopischen Warrnehmung
-
E. Abbe, "Beiträge zur Theorie des Mikroskops und der Mikroskopischen Warrnehmung," Archiv fuer Mikroskopische Anatomie 9, 413-468 (1873).
-
(1873)
Archiv fuer Mikroskopische Anatomie
, vol.9
, pp. 413-468
-
-
Abbe, E.1
-
12
-
-
0031289456
-
The Abbe sine condition and related imaging conditions in geometrical optics
-
J. Bratt, "The Abbe sine condition and related imaging conditions in geometrical optics," in Proc. SPIE 3190, 59-64 (1997).
-
(1997)
Proc. SPIE
, vol.3190
, pp. 59-64
-
-
Bratt, J.1
-
13
-
-
0000983806
-
Generalized Schwarzshild mirror systems with glancing incidence as optics for x-rays
-
H. Wolter, "Generalized Schwarzshild mirror systems with glancing incidence as optics for x-rays," Ann. Phys. 10, 286-295 (1952).
-
(1952)
Ann. Phys
, vol.10
, pp. 286-295
-
-
Wolter, H.1
-
14
-
-
0015625904
-
Wolter-Schwarzshild telescopes for x-ray astronomy
-
R. C. Chase and L. P. Van Speybroeck, "Wolter-Schwarzshild telescopes for x-ray astronomy," Appl. Opt. 12, 1042-1044 (1973).
-
(1973)
Appl. Opt
, vol.12
, pp. 1042-1044
-
-
Chase, R.C.1
Van Speybroeck, L.P.2
-
15
-
-
0016546158
-
Ellipsoid-Hyperboloid x-ray imaging instrument for laser-pellet diagnostics
-
R. C. Chase and J. K. Silk, "Ellipsoid-Hyperboloid x-ray imaging instrument for laser-pellet diagnostics," Appl. Opt. 14, 2096-2098 (1975).
-
(1975)
Appl. Opt
, vol.14
, pp. 2096-2098
-
-
Chase, R.C.1
Silk, J.K.2
-
16
-
-
0010080129
-
A grazing incident microscope for x-ray imaging applications
-
J. K. Silk, "A grazing incident microscope for x-ray imaging applications," Ann. N.Y. Acad. Sci. 342, 116-129 (1980).
-
(1980)
Ann. N.Y. Acad. Sci
, vol.342
, pp. 116-129
-
-
Silk, J.K.1
-
17
-
-
24644498099
-
Development of the ASML EUV alpha demo tool
-
H. Meiling, V. Banine, N. Harned, B. Blum, P. Kuerz, and H. Meijer, "Development of the ASML EUV alpha demo tool," in Proc. SPIE 5751, 90-101 (2005).
-
(2005)
Proc. SPIE
, vol.5751
, pp. 90-101
-
-
Meiling, H.1
Banine, V.2
Harned, N.3
Blum, B.4
Kuerz, P.5
Meijer, H.6
-
18
-
-
33745628745
-
First performance results of the ASML alpha demo tool
-
H. Meiling, H. Meijer, V. Banine, R. Moors, R. Groeneveld, H.-J. Voorma, U. Mickan, B. Wolschrijn, B. Mertens, G. van Baars, P. Kürz, and N. Harned, "First performance results of the ASML alpha demo tool," in Proc. SPIE 6151, 49-60 (2006).
-
(2006)
Proc. SPIE
, vol.6151
, pp. 49-60
-
-
Meiling, H.1
Meijer, H.2
Banine, V.3
Moors, R.4
Groeneveld, R.5
Voorma, H.-J.6
Mickan, U.7
Wolschrijn, B.8
Mertens, B.9
van Baars, G.10
Kürz, P.11
Harned, N.12
-
19
-
-
24644503076
-
Lithographic performance of high-numerical-aperture (NA = 0.3) EUV small-field exposure tool (HINA)
-
H. Oizumi, Y. Tanaka, F. Kumasaka, I. Nishiyama, H. Kondo, M. Shiraishi, T. Oshino, K. Sugisaki, and K. Murakami, "Lithographic performance of high-numerical-aperture (NA = 0.3) EUV small-field exposure tool (HINA)," in Proc. SPIE 5751, 102-109 (2005).
-
(2005)
Proc. SPIE
, vol.5751
, pp. 102-109
-
-
Oizumi, H.1
Tanaka, Y.2
Kumasaka, F.3
Nishiyama, I.4
Kondo, H.5
Shiraishi, M.6
Oshino, T.7
Sugisaki, K.8
Murakami, K.9
-
20
-
-
33745612430
-
Nikon EUVL development progress summary
-
T. Miura, K. Murakami, K. Suzuki, Y. Kohama, Y. Ohkubo, and T. Asami, "Nikon EUVL development progress summary," in Proc. SPIE 6151, 20-29 (2006).
-
(2006)
Proc. SPIE
, vol.6151
, pp. 20-29
-
-
Miura, T.1
Murakami, K.2
Suzuki, K.3
Kohama, Y.4
Ohkubo, Y.5
Asami, T.6
-
21
-
-
24644492299
-
EUV sources for EUV lithography in alpha-, beta-, and high-volume chip manufacturing: An update on GDPP and LPP technology
-
U. Stamm, J. Kleinschmidt, K. Gabel, G. Hergenhan, C. Ziener, G. Schriever, I. Ahmad, D. Bolshukhin, J. Brudermann, R. de Bruijn, T. D. Chin, A. Geier, S. Gotze, A. Keller, V. Korobotchko, B. Mader, J. Ringling, and T. Brauner, "EUV sources for EUV lithography in alpha-, beta-, and high-volume chip manufacturing: an update on GDPP and LPP technology," in Proc. SPIE 5751, 236-247 (2005).
-
(2005)
Proc. SPIE
, vol.5751
, pp. 236-247
-
-
Stamm, U.1
Kleinschmidt, J.2
Gabel, K.3
Hergenhan, G.4
Ziener, C.5
Schriever, G.6
Ahmad, I.7
Bolshukhin, D.8
Brudermann, J.9
de Bruijn, R.10
Chin, T.D.11
Geier, A.12
Gotze, S.13
Keller, A.14
Korobotchko, V.15
Mader, B.16
Ringling, J.17
Brauner, T.18
-
22
-
-
24644496630
-
Integrating Philips's extreme UV source in the alpha tools
-
J. Pankert, R. Apetz, K. Bergmann, G. Derra, M. Janssen, J. Jonkers, J. Klein, T. Kruecken, A. List, M. Loeken, C. Metzmacher, W. Neff, S. Probst, R. Prummer, O. Rosier, S. Seiwert, G. Siemons, D. Vaudrevange, D. Wagemann, A. Weber, P. Zink, and O. Zitzen, "Integrating Philips's extreme UV source in the alpha tools," in Proc. SPIE 5751, 260-271 (2005).
-
(2005)
Proc. SPIE
, vol.5751
, pp. 260-271
-
-
Pankert, J.1
Apetz, R.2
Bergmann, K.3
Derra, G.4
Janssen, M.5
Jonkers, J.6
Klein, J.7
Kruecken, T.8
List, A.9
Loeken, M.10
Metzmacher, C.11
Neff, W.12
Probst, S.13
Prummer, R.14
Rosier, O.15
Seiwert, S.16
Siemons, G.17
Vaudrevange, D.18
Wagemann, D.19
Weber, A.20
Zink, P.21
Zitzen, O.22
more..
-
23
-
-
24644456865
-
EUV source system development update: Advancing along the path to HVM
-
D. W. Myers, I. V. Fomenkov, B. A. Hansson, B. C. Kiene, and D. C. Brandt, "EUV source system development update: advancing along the path to HVM," in Proc. SPIE 5751, 248-259 (2005).
-
(2005)
Proc. SPIE
, vol.5751
, pp. 248-259
-
-
Myers, D.W.1
Fomenkov, I.V.2
Hansson, B.A.3
Kiene, B.C.4
Brandt, D.C.5
-
24
-
-
0034757236
-
Extreme ultraviolet sources for lithography applications
-
V. Banine and R. Moors, "Extreme ultraviolet sources for lithography applications," in Proc. SPIE 4343, 203-214 (2001).
-
(2001)
Proc. SPIE
, vol.4343
, pp. 203-214
-
-
Banine, V.1
Moors, R.2
-
25
-
-
33745615551
-
Next generation extreme ultraviolet sources for lithography applications
-
presented at the, San Diego, Calif, 7-9 November
-
V. Banine, "Next generation extreme ultraviolet sources for lithography applications," presented at the fourth Sematech EUVL Symposium, San Diego, Calif., 7-9 November 2005.
-
(2005)
fourth Sematech EUVL Symposium
-
-
Banine, V.1
-
26
-
-
1942453839
-
High performance multilayer coatings for EUV lithography
-
E. Spiller, "High performance multilayer coatings for EUV lithography," in Proc. SPIE 5193, 89-97 (2003).
-
(2003)
Proc. SPIE
, vol.5193
, pp. 89-97
-
-
Spiller, E.1
-
27
-
-
0029368444
-
Evaluating of large area Mo/Si multilayer soft x-ray mirrors fabricated by RF magnetron sputtering
-
H. Takenaka, T. Kawamura, T. Haga, H. Kinoshita, and Y. Ishii, "Evaluating of large area Mo/Si multilayer soft x-ray mirrors fabricated by RF magnetron sputtering," Jpn. J. Appl. Phys. 34, 5027-5031 (1995).
-
(1995)
Jpn. J. Appl. Phys
, vol.34
, pp. 5027-5031
-
-
Takenaka, H.1
Kawamura, T.2
Haga, T.3
Kinoshita, H.4
Ishii, Y.5
-
29
-
-
0012769165
-
Enhanced reflectivity of soft x-ray multilayer mirrors by reduction of Si atomic density
-
R. Schlatmann, A. Keppel, Y. Xue, J. Verhoeven, and M. J. van der Wiel, "Enhanced reflectivity of soft x-ray multilayer mirrors by reduction of Si atomic density," Appl. Phys. Lett. 63, 3297-3299 (1993).
-
(1993)
Appl. Phys. Lett
, vol.63
, pp. 3297-3299
-
-
Schlatmann, R.1
Keppel, A.2
Xue, Y.3
Verhoeven, J.4
van der Wiel, M.J.5
-
30
-
-
0141724851
-
The EUV program at ASML: An update
-
H. Meiling, V. Banine, P. Kürz, B. Blum, G. J. Heerens, and N. Harned, "The EUV program at ASML: an update," in Proc. SPIE 5037, 24-35 (2003).
-
(2003)
Proc. SPIE
, vol.5037
, pp. 24-35
-
-
Meiling, H.1
Banine, V.2
Kürz, P.3
Blum, B.4
Heerens, G.J.5
Harned, N.6
-
31
-
-
0141724844
-
Lithographic characterization of improved projection optics in the EUVL engineering test stand
-
D. J. O'Connell, S. H. Lee, W. P. Ballard, D. A. Tichenor, L. J. Bernardez, S. J. Haney, T. A. Johnson, P. K. Barr, A. H. Leung, K. L. Jefferson, W. C. Replogle, J. E. M. Goldsmith, H. N. Chapman, P. Naulleau, S. Wurm, and E. Panning, "Lithographic characterization of improved projection optics in the EUVL engineering test stand," in Proc. SPIE 5037, 83-94 (2003).
-
(2003)
Proc. SPIE
, vol.5037
, pp. 83-94
-
-
O'Connell, D.J.1
Lee, S.H.2
Ballard, W.P.3
Tichenor, D.A.4
Bernardez, L.J.5
Haney, S.J.6
Johnson, T.A.7
Barr, P.K.8
Leung, A.H.9
Jefferson, K.L.10
Replogle, W.C.11
Goldsmith, J.E.M.12
Chapman, H.N.13
Naulleau, P.14
Wurm, S.15
Panning, E.16
-
32
-
-
33745598084
-
Scaling EUV lithography beyond 0.25 NA with applications to patterning contacts
-
presented at the, San Diego, Calif, 7-9 November
-
M. Chandhok, "Scaling EUV lithography beyond 0.25 NA with applications to patterning contacts," presented at the fourth Sematech EUVL Symposium, San Diego, Calif., 7-9 November 2005.
-
(2005)
fourth Sematech EUVL Symposium
-
-
Chandhok, M.1
-
33
-
-
0005283666
-
The status of x-ray mirror production for the ESA XMM spacecraft
-
D. de Chambure, R. Laine, K. v. Katwijk, J. v. Casteren, and P. Glaude, "The status of x-ray mirror production for the ESA XMM spacecraft," in Proc. SPIE 2808, 362-375 (1996).
-
(1996)
Proc. SPIE
, vol.2808
, pp. 362-375
-
-
de Chambure, D.1
Laine, R.2
Katwijk, K.V.3
Casteren, J.V.4
Glaude, P.5
-
34
-
-
0033347140
-
Replicated grazing incidence x-ray optics: Past, present, and future
-
R. Hudec, L. Pina, and A. Inneman, "Replicated grazing incidence x-ray optics: past, present, and future," in Proc. SPIE 3766, 62-71 (1999).
-
(1999)
Proc. SPIE
, vol.3766
, pp. 62-71
-
-
Hudec, R.1
Pina, L.2
Inneman, A.3
-
35
-
-
33745625061
-
Design and optimization of collectors for extreme ultraviolet lithography
-
F. E. Zocchi, E. Buratti, and V. Rigato, "Design and optimization of collectors for extreme ultraviolet lithography," in Proc. SPIE 6151, 61510T (2006).
-
(2006)
Proc. SPIE
, vol.6151
-
-
Zocchi, F.E.1
Buratti, E.2
Rigato, V.3
-
36
-
-
0004932883
-
-
B. L. Henke, E. M. Gullikson, and J. C. Davis, X-ray interactions: photoabsorption, scattering, transmission and reflection at E = 50-30,000 eV, Z = 1-92, At. Data Nucl. Data Tables 54, 181 (1993); see also http://www-cxro.lbl.gov/optical-constants.
-
B. L. Henke, E. M. Gullikson, and J. C. Davis, "X-ray interactions: photoabsorption, scattering, transmission and reflection at E = 50-30,000 eV, Z = 1-92," At. Data Nucl. Data Tables 54, 181 (1993); see also http://www-cxro.lbl.gov/optical-constants.
-
-
-
-
37
-
-
0041341643
-
Confocal prolate spheroids in an off-axis system
-
O. N. Stavroudis and A. J. Ames, "Confocal prolate spheroids in an off-axis system," J. Opt. Soc. Am. A 9, 2083-2088 (1992).
-
(1992)
J. Opt. Soc. Am. A
, vol.9
, pp. 2083-2088
-
-
Stavroudis, O.N.1
Ames, A.J.2
-
38
-
-
3843109905
-
Structure of the modern schiefspiegler. I. Pseudo axis, magnification, and distortion
-
O. N. Stavroudis and R. F. Hernandez, "Structure of the modern schiefspiegler. I. Pseudo axis, magnification, and distortion," J. Opt. Soc. Am. A 15, 437-442 (1998).
-
(1998)
J. Opt. Soc. Am. A
, vol.15
, pp. 437-442
-
-
Stavroudis, O.N.1
Hernandez, R.F.2
-
39
-
-
0021828912
-
Conical imaging mirrors for high-speed x-ray telescopes
-
R. Petre and P. J. Serlemitsos, "Conical imaging mirrors for high-speed x-ray telescopes," Appl. Opt. 24, 1833-1837 (1985).
-
(1985)
Appl. Opt
, vol.24
, pp. 1833-1837
-
-
Petre, R.1
Serlemitsos, P.J.2
-
40
-
-
84975598761
-
Optics for the x-ray imaging concentrators aboard the x-ray astronomy satellite SAX
-
O. Citterio, G. Bonelli, G. Conti, E. Mattaini, E. Santambrogio, B. Sacco, E. Lanzara, H. Brauninger, and W. Burkert, "Optics for the x-ray imaging concentrators aboard the x-ray astronomy satellite SAX," Appl. Opt. 27, 1470-1475 (1988).
-
(1988)
Appl. Opt
, vol.27
, pp. 1470-1475
-
-
Citterio, O.1
Bonelli, G.2
Conti, G.3
Mattaini, E.4
Santambrogio, E.5
Sacco, B.6
Lanzara, E.7
Brauninger, H.8
Burkert, W.9
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