The EUV program at ASML: An update

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 24-35

  Meiling, Hans ^a   Banine, Vadim ^a   Kürz, Peter ^b   Blum, Brian ^c   Heerens, Gert Jan ^d   Harned, Noreen ^c  

^a ASML   (Netherlands)

^b CARL ZEISS SMT AG   (Germany)

^c ASML US Inc   (United States)

^d TNO   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

MIRRORS; MOLYBDENUM COMPOUNDS; OPTICS; OXIDATION; SENSORS; ULTRAVIOLET RADIATION; WATER;

EXTREME ULTRAVIOLET LITHOGRAPHY; PARTICLE DETECTION SYSTEM;

PHOTOLITHOGRAPHY;

EID: 0141724851     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.483706     Document Type: Conference Paper

References (15)

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2. See various authors at 1st International EUV Lithography Symposium, Dallas, TX, USA (2002), and various authors in SPIE Symposium on Emerging Lithographic Technologies VI, Vol. 4688 (2002).
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