High performance multilayer coatings for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5193, Issue , 2004, Pages 89-97

  Spiller, Eberhard ^a  

^a Spiller X ray Optics   (United States)

Author keywords

Deposition methods; Extreme Ultraviolet; Lithography. Mo Si multilayer coatings; Mirror optics, masks

Indexed keywords

DEPOSITION METHODS; EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; MIRROR OPTICS; MO-SI MULTILAYER COATINGS;

COATINGS; DEPOSITION; LIGHT REFLECTION; MASKS; MIRRORS; MULTILAYERS; SURFACE ROUGHNESS; THIN FILMS; ULTRAVIOLET RADIATION;

ION BEAM LITHOGRAPHY;

EID: 1942453839     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.507237     Document Type: Conference Paper

References (28)

1. S. Bajt, J. Alameda, T. Barbee Jr, W. M. Clift, J. A. Folta, B. Kaufmann, and E. Spiller, "Improved reflectance and stability of Mo/Si mutilayers" Opt. Engin., 41, 1797-1804, (2002).
2. E. M. Gullikson, S. Mrowka, and B. B. Kaufmann, "Recent Developments in EUV Reflectometry at the Advanced Light Source." Proc. SPIE, 4343, 363-373, (2001).
3. S. D. Hector, E. M. Gullikson, P. B. Mirkarimi, E. Spiller, P. A. Kearney, and J. A. Folta, "Multilayer coating requirements for extreme ultraviolet lithography masks" Proc. SPIE, 4562, 863-882, (2002).
4. E. Spiller, "Enhancement of the reflectivity of multilayer x-ray mirrors by ion polishing" Opt. Eng., 29, 609-613, (1990).
5. E. J. Puik, M. J. van der Wiel, H. Zeijlemaker, and J. Verhoeven, "Ion bombardment of x-ray multilayer coatings: comparison of ion etching and ion assisted deposition" Appl. Surface Science, 47, 251-260, (1991).
6. E. Louis, A. E. Yakshin, P. C. Goerts, S. Oestreich, R. Stuik, E. L. Maas, M. J. Kessels, F. Bijkerk, M. Haidl, S. Muellender, M. Mertin, D. Schmitz, F. Scholze, and G. Ulm, "Progress in Mo/Si multilayer coating technology for EUVL optics" Proc. SPIE, 3997, 406-411, (2000).
7. B. Schmiedekamp, A. Kloidt, H. J. Stock:, U. Kleineberg, T. Döhring, M. Pröpper, S. Rahn, K. Higers, B. Heidemann, T. Tappe, U. Heinzmann, M. K. Krumrey, P. Müller, F. Scholze, and K. F. Heidemann, "Electrom-beam deposited Mo/Si multilayer x-ray mirrors and gratings" Opt. Eng., 33, 1314-1321, (1994).
8. E. Spiller, A. Segmüller, J. Rife, and R.-P. Haelbich, "Controlled fabrication of multilayer soft x-ray mirrors" Appl. Phys. Lett., 37, 1048-1050, (1980).
9. T. W. Barbee, Jr., S. Mrowka, and M. C. Hettrick, "Molybdenum- silicon multilayer mirrors for the extreme ultraviolet" Appl. Opt., 24, 883-886, (1985).
10. S. P. Vernon, D. G. Stearns, and R. S. Rosen, "Ion-assisted sputter deposition of molybdenum-silicon multilayers" Appl. Optics, 32, 6969-6974, (1993).
11. F. Eriksson, G. A. Johansson, H. M. Hertz, and J. Birch, "Enhanced soft x-ray reflectivity of Cr/Sc multilayers by ion-assisted sputter deposition" Opt. Eng., 41, 2903-2909, (2002).
12. P. A. Kearney, C. E. Moore, S. I. Tan, S. P. Vernon, and R. A. Levesque, "Mask blanks for extreme ultraviolet lithography: Ion beam sputter deposition of low defect density Mo/Si multilayers" J. Vac. Science & Techn. B, 15, 2452-2454, (1997).
13. E. Spiller, S. Baker, P. Mirkarimi, V. Sperry, E. Gullikson, and D. Stearns, "High Performance Mo/Si Multilayer Coatings for EUV Lithography using Ion Beam deposition" Appl. Opt., 42, 4049-4058, (2003).
14. P. B. Mirkarimi, E. A. Spiller, D. G. Stearns, V. Sperry, and S. L. Baker, "An ion-assisted Mo-Si deposition process for Planarizing reticle substrates for extreme ultraviolet lithography" IEEE J. of Quantum Electronics, 37, 1514-1516, (2001).
15. P. B. Mirkarimi, E. Spiller, S. L. Baker, and V. Sperry, "Developing a viable multilayer coating process for extreme ultraviolet lithography reticles" J. of Microlithography, Microfabrication, and Microsystems, to be published, (2003).
16. S. Braun, R. Dietsch, M. Haidl, T. Holz, H. Mai, S. Mullender, and R. Scholz, "Mo/Si-multilayers for EUV applications prepared by pulsed laser deposition (PLD)" Microelectronic Engineering, 57-58, 9-15, (2001).
17. D. L. Windt and W. K. Waskiewicz, "Multilayer Facilities Required for Extreme-Ultraviolet Lithography" J Vac Sci Technol B, 12, 3826-3832, (1994).
18. C. Montcalm, E. Spiller, F. J. Weber, M. Wedowski, J. A. Folta, and E. M. Gullikson, "Multilayer coating and test of the optics for two new 10x microstepper extreme-ultraviolet lithographic cameras" J. Vac. Sci. Technol. B, 19, 1219-1228, (2001).
19. S. P. Vernon, M. J. Carey, D. P. Gaines, and F. J. Weber, "Multilayer Coatings for the EUV Lithography Front-End Test Bed," in Extreme Ultraviolet Lithography, vol. 23, F. Zernike and D. T. Attwood, Eds. Monterey, CA: OSA proceedings, 1994, pp. 33-40.
20. J. A. Folta, S. Bajt, J. Troy W. Barbee, F. R. Grabner, P. B. Mirkarimi, C. Montcalm, T. Nguyen, M. A. Schmidt, E. Spiller, C. C. Walton, and M. Wedowski, "Advances in multilayer reflective coatings for extreme-ultraviolet lithography" Proc SPIE, 3676, 702-709, (1999).
21. R. Soufli, E. Spiller, M. A. Schmidt, C. Davidson, R. F. Grabner, E. M. Gullikson, B. B. Kaufmann, S. Mrowka, S. L. Baker, H. N. Chapman, R. M. Hudyma, J. S. Taylor, C. C. Walton, C. Montcalm, and J. A. Folta, "Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution" Proc. SPIE, 4343, 51-59, (2001).
22. D. G. Stearns, R. S. Rosen, and S. P. Vernon, "Multilayer Mirror Technology for Soft-X-Ray Projection Lithography" Appl Opt, 32, 6952-6960, (1993).
23. H. J. Hagemann, W. Gudat, and C. Kunz, "Optical constants from the far infrared to the x-ray region: Mg, Al, Cu, Ag, Au, Bi, C and Al2O3" J. Opt. Soc. Am., 65, 742-744, (1975).
24. D. G. Stearns, R. S. Rosen, and S. P. Vernon, "Normal incidence x ray mirror for 7 nm" Opt. Lett. (USA), 16, 1283-1285, (1991).
25. L. Klebanoff, W. Clift, M. Malinowski, C. Steinhaus, P. Grunow, and S. Bajt, "Radiation-induced protective carbon coating for extreme ultraviolet optics" J. Vacuum Sci. & Techn. B, 20, 696-703, (2002).
26. S. Bajt, H. N. Chapman, N. Nguyen, J. Alameda, J. C. Robinson, M. Malinowski, E. Gullikson, A. Aquila, C. Tarrio, and S. Grantham, "Design and performance of capping layers for EUV multilayer mirrors" Proc. SPIE, 5037, 236-248, (2003).
27. J. S. Taylor, D. Sweeney, R. Hudyma, L. Hale, T. Dekker, G. Kubiak, W. Sweatt, and N. Wester, "EUV Micro-Exposure Tool (MET) for near term development using a high N-A projection system," presented at 2nd Intnatl. Workshop on EUV Lithography ., Burlingame, CA, 2000.
28. E. M. Gullikson, J. Taylor, K. Blaedel, S. Baker, and C. Larson, "EUV scattering from mask substrate roughness," presented at 1st International EUV Lithography Symposium, Dallas, Texas, 2002.