Extreme ultraviolet sources for lithography applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue , 2001, Pages 203-214

  Banine, V ^a   Moors, R ^a  

^a ASML   (Netherlands)

Author keywords

EUV; Lithography; Source

Indexed keywords

BAND STRUCTURE; DOSIMETRY; LIGHT PULSE GENERATORS; LIGHT SOURCES; THERMAL LOAD; ULTRAVIOLET DEVICES; ULTRAVIOLET RADIATION; WAVELENGTH DIVISION MULTIPLEXING;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTOLITHOGRAPHY;

EID: 0034757236     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436651     Document Type: Conference Paper

References (9)

1. Peak and integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multi-layer, multi-element optics for extreme ultraviolet lithography
2. Relationship between an EUV source, and the performance of an EUV lithographic system