Design and optimization of collectors for extreme ultra-violet lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 I, Issue , 2006, Pages

  Zocchi, Fabio E ^a   Buratti, Enrico ^a   Rigato, Valentino ^a,b  

^a Media Lario Technologies   (Italy)

^b LABORATORI NAZIONALI DI LEGNARO   (Italy)

Author keywords

Collection efficiency; Collector; Extreme ultra violet lithography; Far field uniformity

Indexed keywords

BOUNDARY CONDITIONS; LITHOGRAPHY; NUMERICAL ANALYSIS; OPTIMIZATION; THERMAL LOAD;

COLLECTION EFFICIENCY; COLLECTOR; EXTREME ULTRA-VIOLET LITHOGRAPHY; FAR FIELD UNIFORMITY;

SOLAR COLLECTORS;

EID: 33745625061     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656417     Document Type: Conference Paper

References (18)

1. V. Banine and R. Moors, "Extreme ultraviolet sources for lithography applications," Proc. SPIE 4343, 203-214 (2001).
2. th Sematech EUVL Symposium, San Diego, CA, 7-9 Nov. 2005.
3. U. Stamm, J. Kleinschmidt, K. Gabel, G. Hergenhan, C. Ziener, G. Schriever, I. Ahmad, D. Bolshukhin, J. Brudermann, R. de Bruijn, T. D. Chin, A. Geier, S. Gotze, A. Keller, V. Korobotchko, B. Mader, J. Ringling, T. Brauner, "EUV sources for EUV lithography in alpha-, beta-, and high volume chip manufacturing: an update on GDPP and LPP technology," Proc. SPIE 5751, 236-247 (2005).
4. J. Pankert, R. Apetz, K. Bergmann, G. Derra, M. Janssen, J. Jonkers, J. Klein, T. Kruecken, A. List, M. Loeken, C. Metzmacher, W. Neff, S. Probst, R. Prummer, O. Rosier, S. Seiwert, G. Siemons, D. Vaudrevange, D. Wagemann, A. Weber, P. Zink, O. Zitzen, "Integrating Philips' extreme UV source in the alpha-tools," Proc. SPIE 5751, 260-271 (2005).
5. D. W. Myers, I. V. Fomenkov, B. A. Hansson, B. C. Klene, D. C. Brandt, "EUV source system development update: advancing along the path to HVM," Proc. SPIE 5751, 248-259 (2005).
6. E. Spiller, "High performance multilayer coatings for EUV lithography" Proc. SPIE 5193, 89-97 (2003).
7. H. Takenaka, T. Kawamura, T. Haga, H. Kinoshita and Y. Ishii, "Evaluating of large area Mo/Si multilayer soft X-ray mirrors fabricated by RF magnetron sputtering," Jpn. J. of Appl. Phys. 34, 5027-5031 (1995).
8. 3/Si multilayers soft X-ray mirrors," J. of Appl Phys, 78, 5227-5230 (1995).
9. R. Schlatmann, A. Keppel, Y. Xue, J Verhoeven, M.J. van der Wiel, "Enhanced reflectivity of soft X-ray multilayer mirrors by reduction of Si atomic density," Appl. Phys. Lett. 63, 3297-3299 (1993).
10. H. Meiling, V. Banine, P. Kürz, B. Blum, G.J. Heerens, N. Harned, "The EUV program at ASML: an update," Proc. SPIE 5037, 24-35 (2003).
11. D.J. O'Connell, S.H. Lee, W.P. Ballard, D.A. Tichenor, L.J. Bernardez, S.J. Haney, T.A. Johnson, P.K. Barr, A.H. Leung, K.L. Jefferson, W.C. Replogle, J.E.M. Goldsmith, H.N. Chapman, P. Naulleau, S. Wurm, E. Panning, "Lithographic characterization of improved projection optics in the EUVL engineering test stand," Proc. SPIE 5037, 83-94 (2003).
12. th Sematech EUVL Symposium, San Diego, CA, 7-9 Nov. 2005.
13. H.Wolter, "Mirror systems with glancing incidence as image-producing optics for X-rays," Ann. Phys. 10, 94-114 (1952).
14. D. de Chambure, R. Lainè, K. v. Katwijk, J. v. Casteren, P. Glaude, "The status of X-Ray mirror production for the ESA XMM spacecraft," Proc. SPIE 2008, 362-375 (1996).
15. R. Hudec, L. Pina, A. Inneman, "Replicated grazing incidence X-ray optics: past present and future," Proc. SPIE 3766, 62-71 (1999).
16. B.L. Henke, E.M. Gullikson, and J.C. Davis, "X-Ray Interactions: Photoabsorption, Scattering, Transmission and Reflection at E=50-30,000 eV, Z=1-92," Atomic Data and Nuclear Data Tables 54, p. 181 (1993); see also http:/ /www-cxro.lbl.gov/optical-constants.
17. G. Derra and W. Singer, "Collection efficiency of EUV sources" Proc. SPIE 5037, 728-741 (2003).
18. H. Franken, V. Banine, K. Ota, Y. Watanabe, "Update on EUV source requirements," Sematech EUVL Source Workshop, San Diego, CA, 10 Nov. 2005.