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Electrochemical and Solid-State Letters

Volumn 10, Issue 2, 2007, Pages

Synthesis of graded Hf-silicate thin films for alternate gate dielectric applications

(5) Ramani, K a,b,c Kumar, P a Siebein, K a Craciun, V a Singh, R K a,b

a J Crayton Pruitt Family Department of Biomedical Engineering (United States)

b ELECTROCHEMICAL SOCIETY (United States)

c ADVANCED MICRO DEVICES (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GATE DIELECTRIC; SILICATE BONDING; ULTRAVIOLET RADIATION ASSISTED OXIDATION;

DIELECTRIC MATERIALS; GATES (TRANSISTOR); HAFNIUM COMPOUNDS; INTERFACES (MATERIALS); PERMITTIVITY; PULSED LASER DEPOSITION; RAPID THERMAL ANNEALING;

THIN FILMS;

EID: 33845951335 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.2402981 Document Type: Article

Times cited : (5)

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