Development of an automated vapor/liquid hybrid deposition system to form high-k dielectrics

Chemical Vapor Deposition

Volumn 12, Issue 4, 2006, Pages 214-219

  Hojo, Daisuke ^a   Xuan, Yi ^a   Yasuda, Tetsuji ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Adsorption; Atomic layer deposition; High k dielectrics; Hydrolysis; Vapor liquid hybrids

Indexed keywords

ADSORPTION; HYDROLYSIS; MULTILAYERS; PHASE TRANSITIONS; VAPOR DEPOSITION;

ATOMIC LAYER DEPOSITION (ALD); HIGH-K DIELECTRICS; METAL PRECURSORS; VAPOR/LIQUID HYBRID DEPOSITION (VALID);

DIELECTRIC MATERIALS;

EID: 33845563928     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.200506438     Document Type: Article

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