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Volumn 15, Issue 22, 2003, Pages 4157-4159

Vapor-Liquid Hybrid Deposition Process for Device-Quality Metal Oxide Film Growth

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; DIELECTRIC MATERIALS; ELECTRIC PROPERTIES; HYDROLYSIS; ULTRATHIN FILMS; VAPOR DEPOSITION;

METAL OXIDES;

FILM GROWTH;

METAL OXIDE;

ADSORPTION; ARTICLE; CHEMICAL REACTION; DIELECTRIC CONSTANT; ELECTRIC ACTIVITY; FILM; HYDROLYSIS; LIQUID; PHASE TRANSITION; ROOM TEMPERATURE; VAPOR;

EID: 0242710520 PISSN: 08974756 EISSN: None Source Type: Journal
DOI: 10.1021/cm034437s Document Type: Article

Times cited : (11)

References (12)

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