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Volumn 10, Issue 9, 1998, Pages 2329-2331

New Precursors for Chemical Vapor Deposition of Iridium

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Indexed keywords


EID: 0001597819     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm980346x     Document Type: Article
Times cited : (39)

References (16)
  • 10
    • 85033908994 scopus 로고    scopus 로고
    • U.S. Patent (pending), 1997
    • Baum, T. H.; Dimeo, F. U.S. Patent (pending), 1997.
    • Baum, T.H.1    Dimeo, F.2
  • 11
    • 0542452146 scopus 로고
    • Kodas, T. T., Hampden-Smith, M. J., Eds.; VCH: New York, Chapter 8
    • Hampden-Smith, M. J.; Kodas, T. T. The Chemistry of Metal CVD; Kodas, T. T., Hampden-Smith, M. J., Eds.; VCH: New York, 1994; Chapter 8, pp 398-9.
    • (1994) The Chemistry of Metal CVD , pp. 398-399
    • Hampden-Smith, M.J.1    Kodas, T.T.2
  • 16
    • 0542428397 scopus 로고
    • Kodas, T. T., Hampden-Smith, M. J., Eds.; VCH: New York, Chapter 5
    • Hampden-Smith, M. J.; Kodas, T. T. In The Chemistry of Metal CVD; Kodas, T. T., Hampden-Smith, M. J., Eds.; VCH: New York, 1994; Chapter 5, pp 267-8.
    • (1994) The Chemistry of Metal CVD , pp. 267-268
    • Hampden-Smith, M.J.1    Kodas, T.T.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.