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Volumn 388, Issue 1-2, 2001, Pages 126-133

Iridium precursor pyrolysis and oxidation reactions and direct liquid injection chemical vapor deposition of iridium films

(7) Endle, J P a Sun, Y M a Nguyen, N a Madhukar, S b Hance, R L b White, J M a Ekerdt, J G a,c

a UNIVERSITY OF TEXAS AT AUSTIN (United States)

b MOTOROLA INC (United States)

c The University of Texas at Austin (United States)

Author keywords

Chemical vapor; Iridium; Organometallic vapor; Pryolysis

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; FILM GROWTH; IRIDIUM; ORGANOMETALLICS; OXIDATION; OXYGEN; PARTIAL PRESSURE; PYROLYSIS; SILICA; SUBSTRATES; TITANIUM NITRIDE; TOLUENE;

DIRECT LIQUID INJECTION CHEMICAL VAPOR DEPOSITION;

METALLIC FILMS;

EID: 0035372046 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)00808-2 Document Type: Article

Times cited : (31)

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