Deposition of iridium thin films using new IrI CVD precursors

Chemical Vapor Deposition

Volumn 8, Issue 1, 2002, Pages 17-20

  Chen, Yao Lun ^a   Liu, Chao Shiuan ^a   Chi, Yun ^a   Carty, Arthur J ^b   Peng, Shie Ming ^c   Lee, Gene Hsiang ^c  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

^c NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002451171     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3862(20020116)8:1<17::AID-CVDE17>3.0.CO;2-3     Document Type: Article

References (24)