Nanoimprint lithography using IR laser irradiation

Applied Surface Science

Volumn 253, Issue 2, 2006, Pages 646-650

  Grigaliunas, V ^a   Tamulevicius S ^a   Muehlberger, M ^b   Jucius, D ^a   Guobiene, A ^a   Kopustinskas, V ^a   Gudonyte, A ^a  

^a KAUNAS UNIVERSITY OF TECHNOLOGY   (Lithuania)

^b PROFACTOR GMBH   (Austria)

Author keywords

CO 2 laser; Nanoimprint lithography; Plasma treatment; RIBE

Indexed keywords

CARBON DIOXIDE LASERS; LASER BEAM EFFECTS; LITHOGRAPHY; REACTIVE ION ETCHING; SPIN COATING; TEMPERATURE CONTROL;

IR LASER IRRADIATION; NANOIMPRINT LITHOGRAPHY; PLASMA TREATMENT;

THERMOPLASTICS;

EID: 33845402989     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.12.166     Document Type: Article

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