Rapid evaluation of imprint quality using optical scatterometry

Microelectronic Engineering

Volumn 71, Issue 2, 2004, Pages 190-196

  Jucius, D ^a   Grigaliunas, V ^a   Guobiene, A ^a  

^a KAUNAS UNIVERSITY OF TECHNOLOGY   (Lithuania)

Author keywords

Diffraction gratings; Imprint lithography; Scatterometry

Indexed keywords

ATOMIC FORCE MICROSCOPY; COOLING; DIFFRACTION GRATINGS; ELASTICITY; LIGHT SCATTERING; LITHOGRAPHY; NONDESTRUCTIVE EXAMINATION; OPTICAL SYSTEMS; PHOTORESISTS; POLYMERS; THIN FILMS;

IMPRINT LITHOGRAPHY; OPTICAL SCATTEROMETRY;

MICROELECTROMECHANICAL DEVICES;

EID: 0347601895     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2003.10.006     Document Type: Article

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