Electron-beam lithography of Co/Pd multilayer with hydrogen silsesquioxane and amorphous Si intermediate layer

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 6, 2006, Pages 2616-2620

  Wi, Jung Sub ^a   Lee, Tae Yon ^a   Jin, Kyung Bae ^a   Hong, Dae Hoon ^b   Shin, Kyung Ho ^b   Kim, Ki Bum ^a  

^a Seoul National University   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; COBALT; ELECTRON BEAM LITHOGRAPHY; HYDROGEN; NANOSTRUCTURED MATERIALS; PALLADIUM; SILICON;

COPD MULTILAYER; HYDROGEN SILSESQUIOXANE; INTERMEDIATE LAYER; NANOWIRE ARRAY;

MULTILAYERS;

EID: 33845274282     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2366615     Document Type: Article

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