Etch Behavior of Pb(ZrXTi1-X)O3 Films Using a TiO2 Hard Mask

Journal of the Electrochemical Society

Volumn 148, Issue 5, 2001, Pages

  Chung, Chee Won ^a   Chung, Ilsub ^b  

^a Inha University   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0442294012     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1360207     Document Type: Article

References (11)

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