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Chemical Vapor Deposition

Volumn 12, Issue 11, 2006, Pages 685-691

Combinatorial initiated CYD for polymeric thin films

(2) Martin, Tyler P a Gleason, Karen K a

a Massachusetts Institute of Technology Cambridge (United States)

Author keywords

Combinatorial; Hot filament CVD; iCVD; Polycation; Polymer

Indexed keywords

ABS RESINS; ACTIVATION ENERGY; ADSORPTION; FILAMENTS (LAMP); FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; FUNCTIONAL GROUPS; INFRARED SPECTROSCOPY; MONOMERS; PLASTIC FILMS; SPECTROSCOPIC ANALYSIS; STRUCTURE (COMPOSITION); SUBSTRATES; THICK FILMS; THIN FILMS;

CHEMICAL STRUCTURES; COMBINATORIAL; COMBINATORIAL DEPOSITIONS; CONSISTENT; DEPOSITION KINETICS; EXPERIMENTAL UNCERTAINTIES; FILAMENT TEMPERATURES; FINE CHEMICALS; FOURIER TRANSFORM INFRARED; HOT FILAMENT CVD; ICVD; IDENTICAL CONDITIONS; NEGATIVE VALUES; POLYCATION; SUBSTRATE TEMPERATURES; VINYL MONOMERS;

CHEMICAL VAPOR DEPOSITION;

EID: 33751341575 PISSN: 09481907 EISSN: 15213862 Source Type: Journal
DOI: 10.1002/cvde.200606495 Document Type: Article

Times cited : (27)

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