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Volumn 9, Issue 3, 2002, Pages 155-164

Use of microhotplates in the controlled growth and characterization of metal oxides for chemical sensing

Author keywords

Chemical vapor deposition; Gas sensor; Membrane; Microhotplate; Micromachined; Tin oxide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRODES; EVAPORATION; FILM GROWTH; OXIDES; SCREEN PRINTING; SPIN COATING; SPUTTERING; SUBSTRATES; TEMPERATURE CONTROL; TIN COMPOUNDS;

EID: 0037677828     PISSN: 13853449     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1023224123925     Document Type: Article
Times cited : (36)

References (51)
  • 27
    • 0038631205 scopus 로고    scopus 로고
    • United Kingdom Patent Specification 1280809
    • N. Taguchi, United Kingdom Patent Specification 1280809.
    • Taguchi, N.1
  • 29
    • 0038631202 scopus 로고
    • edited by P.T. Moseley (IOP Publishing Ltd, Bristol, England)
    • P.T. Moseley and D.E. Williams, in Adam Hilger Series on Sensors, edited by P.T. Moseley (IOP Publishing Ltd, Bristol, England, 1991), p. 46.
    • (1991) Adam Hilger Series on Sensors , pp. 46
    • Moseley, P.T.1    Williams, D.E.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.