Ion attachment mass spectrometry of nonequilibrium atmospheric-pressure pulsed remote plasma for SiO2 etching

Journal of Applied Physics

Volumn 100, Issue 9, 2006, Pages

  Iwasaki, Masahiro ^a   Ito, Masafumi ^b   Uehara, Tsuyoshi ^c   Nakamura, Megumi ^d   Hori, Masaru ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b WAKAYAMA UNIVERSITY   (Japan)

^c SEKISUI CHEMICAL CO LTD   (Japan)

^d Canon ANELVA Technix Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; ETCHING; IONS; MASS SPECTROMETRY; PLASMAS; POLYMERIZATION;

ION ATTACHMENT MASS SPECTROMETRY (IAMS); NONEQUILIBRIUM ATMOSPHERIC-PRESSURE PULSED REMOTE PLASMAS; PULSE FREQUENCIES;

SILICON COMPOUNDS;

EID: 33751116285     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2372736     Document Type: Article

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