Analysis of unstable species in cyclo- C4 F8 plasma by ion attachment mass spectrometry

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 3, 2006, Pages 385-389

  Nakamura, Megumi ^a   Hirano, Yoshiki ^a   Shiokawa, Yoshiro ^a   Takayanagi, Masao ^b   Nakata, Munetaka ^b  

^a Canon ANELVA Technix Corporation   (Japan)

^b TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONTROL SYSTEMS; IONS; MASS SPECTROMETRY; RADIO EQUIPMENT;

CYCLO- C4 F8 PLASMA; ION ATTACHMENT MASS SPECTROMETRY (IAMS);

PLASMAS;

EID: 33646539506     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2177228     Document Type: Article

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