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Shinku/Journal of the Vacuum Society of Japan

Volumn 48, Issue 12, 2005, Pages 619-624

Measurement of the Vacuum Plasma by Ion Attachment Mass Spectrometry (IAMS)

(4) Nakamura, Megumi a Hirano, Yoshiki a Taneda, Yasuyuki a Shiokawa, Yoshiro a

a Canon ANELVA Technix Corporation (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33751109083 PISSN: 05598516 EISSN: None Source Type: Journal
DOI: 10.3131/jvsj.48.619 Document Type: Article

Times cited : (2)

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