On-line monitoring of perfluoro compounds in exhaust gases during semiconductor manufacture: Use of Li+ ion attachment mass spectrometry

Journal of Applied Physics

Volumn 90, Issue 5, 2001, Pages 2180-2184

  Fujii, Toshihiro ^a   Nakamura, Megumi ^b  

^a NATIONAL INSTITUTE FOR ENVIRONMENTAL STUDIES   (Japan)

^b Canon ANELVA Technix Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038844206     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1384857     Document Type: Article

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