CF and CF2 radical densities in 13.56-Mhz CHF3/Ar inductively coupled plasma

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 1, 2002, Pages 319-325

  Nakagawa, Hideo ^a,b   Okigawa, Mitsuru ^a,c   Morishita, Satoshi ^a,d   Noda, Syuichi ^a,e   Hayashi, Hisataka ^a,f   Ito, Katsuyuki ^b   Inoue, Masami ^a   Sekine, Makoto ^a,f  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b PANASONIC CORPORATION   (Japan)

^c SANYO ELECTRIC CO LTD   (Japan)

^d SHARP CORPORATION   (Japan)

^e OKI ELECTRIC INDUSTRY CO   (Japan)

^f TOSHIBA CORPORATION   (Japan)

Author keywords

Actinometry; AMS; CF; Electron density; Electron temperature; F; ICP; LIF; OES; Probe; Wall interaction

Indexed keywords

ABSORPTION SPECTROSCOPY; CARRIER CONCENTRATION; EMISSION SPECTROSCOPY; FLUORESCENCE; FREE RADICALS; INDUCTIVELY COUPLED PLASMA; LASER APPLICATIONS; MASS SPECTROMETRY; SURFACE REACTIONS;

APPEARANCE MASS SPECTROMETRY (AMS); LASER-INDUCED FLUORESCENCE (LIF);

FLUOROCARBONS;

EID: 0036317330     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.41.319     Document Type: Article

References (15)