UV laser deposition of nanostructured Si/C/O/N/H from disilazane precursors and evolution to silicon oxycarbonitride

Applied Organometallic Chemistry

Volumn 20, Issue 10, 2006, Pages 648-655

  Pola, Josef ^a   Galíková, Anna ^a   Bastl, Zdeněk ^b   Šubrt, Jan ^c   Vacek, Karel ^a   Brus, Jiří ^d   Ouchi, Akihiko ^e  

^a INSTITUTE OF CHEMICAL PROCESS FUNDAMENTALS   (Czech Republic)

^b J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY   (Czech Republic)

^c INSTITUTE OF INORGANIC CHEMISTRY   (Czech Republic)

^d INSTITUTE OF MACROMOLECULAR CHEMISTRY   (Czech Republic)

^e NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Chemical vapour deposition; Laser induced photolysis; Methyldisilazanes; Oxycarbonitride

Indexed keywords

LASER-INDUCED PHOTOLYSIS; METHYLDISILAZANES; OXYCARBONITRIDE;

HYDROCARBONS; PHOTOLYSIS; REACTION KINETICS; SILICON; ULTRAVIOLET RADIATION;

NANOSTRUCTURED MATERIALS;

EID: 33749560107     PISSN: 02682605     EISSN: 10990739     Source Type: Journal    
DOI: 10.1002/aoc.1135     Document Type: Article

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