An X-ray photoelectron spectroscopic investigation into the chemical structure of deposits formed from hexamethyldisiloxane/oxygen plasmas

Journal of Materials Science

Volumn 31, Issue 7, 1996, Pages 1879-1885

  Alexander, M R ^a   Short, R D ^a   Jones, F R ^a   Stollenwerk, M ^b   Zabold, J ^b   Michaeli, W ^b  

^a UNIVERSITY OF SHEFFIELD   (United Kingdom)

^b RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; ALUMINUM; BINDING ENERGY; CHEMISTRY; COMPOSITION; DEPOSITS; OXYGEN; STRUCTURE (COMPOSITION); SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

CORE LINE BINDING ENERGY; HEXAMETHYLDISILOXANE; MICROWAVE SUSTAINED PLASMAS; PLASMA DEPOSITS; STANDARD SILICON CONTAINING MATERIAL;

PLASMAS;

EID: 0030128033     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF00372203     Document Type: Article

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