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Volumn 31, Issue 7, 1996, Pages 1879-1885
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An X-ray photoelectron spectroscopic investigation into the chemical structure of deposits formed from hexamethyldisiloxane/oxygen plasmas
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Author keywords
[No Author keywords available]
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Indexed keywords
ADDITION REACTIONS;
ALUMINUM;
BINDING ENERGY;
CHEMISTRY;
COMPOSITION;
DEPOSITS;
OXYGEN;
STRUCTURE (COMPOSITION);
SUBSTRATES;
X RAY PHOTOELECTRON SPECTROSCOPY;
CORE LINE BINDING ENERGY;
HEXAMETHYLDISILOXANE;
MICROWAVE SUSTAINED PLASMAS;
PLASMA DEPOSITS;
STANDARD SILICON CONTAINING MATERIAL;
PLASMAS;
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EID: 0030128033
PISSN: 00222461
EISSN: None
Source Type: Journal
DOI: 10.1007/BF00372203 Document Type: Article |
Times cited : (102)
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References (20)
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