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Applied Organometallic Chemistry

Volumn 14, Issue 9, 2000, Pages 453-464

Perhydridosilicone films produced by IR laser-induced chemical vapour deposition from disiloxane

(5) Pola, Josef a Bastl, Zdeněk b Urbanová, Markéta a Šubrt, Jan c Beckers, Helmut d

a INSTITUTE OF CHEMICAL PROCESS FUNDAMENTALS (Czech Republic)

b J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY (Czech Republic)

c INSTITUTE OF INORGANIC CHEMISTRY (Czech Republic)

d UNIVERSITY OF WUPPERTAL (Germany)

Author keywords

Chemical vapour deposition; Disiloxane, thin films; Laser irradiation

Indexed keywords

ARGON; HYDROGEN; OXYGEN; SILANE; SILICONE DERIVATIVE; SILOXANE; VOLATILE AGENT;

ARTICLE; CHEMICAL REACTION; DECOMPOSITION; FILM; LASER; OXIDATION; POLYMERIZATION; REACTION ANALYSIS; VAPOR;

EID: 0033653611 PISSN: 02682605 EISSN: None Source Type: Journal
DOI: 10.1002/1099-0739(200009)14:9<453::AID-AOC31>3.0.CO;2-C Document Type: Article

Times cited : (13)

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