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Volumn 413, Issue 1-2, 2002, Pages 59-64

Local structure and bonds of amorphous silicon oxynitride thin films

Author keywords

Plasma processing and deposition; Silicon nitride; Silicon oxide; Structural properties

Indexed keywords

AMORPHOUS FILMS; CHEMICAL BONDS; COMPOSITION EFFECTS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MATHEMATICAL MODELS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE; X RAY ANALYSIS;

EID: 0037166605     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00346-2     Document Type: Article
Times cited : (45)

References (44)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.