Deposition of silicon oxinitride films from hexamethyldisilizane (HMDS) by PECVD

Thin Solid Films

Volumn 317, Issue 1-2, 1998, Pages 347-350

  Gonzalez Luna R ^a   Rodrigo, M T ^a   Jimenez C ^a   Martinez Duart J M ^a  

^a UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

Author keywords

Hexamethyldisilazane; Refractive index; Silicon oxinitride films

Indexed keywords

AMMONIA; CHEMICAL VAPOR DEPOSITION; ELASTIC MODULI; HARDNESS; INFRARED SPECTROSCOPY; LIQUIDS; MIXTURES; OPTICAL PROPERTIES; OXYGEN; PLASMA APPLICATIONS; REFRACTIVE INDEX; SILICON COMPOUNDS;

HEZAMETHYLDIXILIZANE; PLASMA ENHANCE CHEMICAL VAPOR DEPOSITION; SILICON OXINITRIDE;

THIN FILMS;

EID: 0032046029     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00650-0     Document Type: Article

References (6)

1. Ch. Täschner, K. Bartsch, A. Leonhardt, Surf. Coat. Technol. 61 (1993) 158-163.
2. R.M. Bueno, J.F. Trigo, J.M. Martínez-Duart, E. Elizalde, J.M. Sanz, J. Vac. Sci. Technol. A 13 (5) (1995) 2378-2383.
3. R.T. Conley (Ed.), Infrared spectroscopy, Allyn and Bacon, 1970.
4. T.A. Brooks, D.W. Hess, J. Appl. Phys. 64 (2) (1988) 841-849.
5. W.C. Oliver, G.M. Pharr, J. Mater. Sci. 7 (6) (1992) 1564-1583.
6. C.G. Granqvist, T.S. Eviksson (Eds.), Materials Science For Solar Energy Convertion Systems, Pergamon Press, 1991.