Optical absorption threshold of low pressure chemically vapor deposited silicon oxynitride films from SiCl2H2-NH3-N2O mixtures

Thin Solid Films

Volumn 437, Issue 1-2, 2003, Pages 266-271

  Davazoglou, Dimitris ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

Chemical vapor deposition (CVD); Dielectrics; Optical properties

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIELECTRIC MATERIALS; SILICON COMPOUNDS; SILICON WAFERS;

SILICON OXYNITRIDE FILMS;

THIN FILMS;

EID: 0038108627     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00683-7     Document Type: Article

References (29)

1. See for example in S. M. Sze 'VLSI Technology', McGraw-Hill (1988).
2. Aoyama T., Tashiro H., Suzuki K. J. Electrochem. Soc. 146:1999;1879.
3. Kooi E., van Lierop J.G., Appels J.A. J. Electrochem. Soc. 123:1976;1117.
4. Nag S., Chatterjee A. Sol. St. Electron. September, 1977;129.
5. Habraken F.H.P.M., Kuiper A.E.T. Mat. Sci. Eng. R12:(3):1994;123.
6. Laxman R.K., Anderson T.D., Mestemacher J.A. Solid State Technol. 43:2000;29.
7. Honlein W., Reisinger H. Appl. Surf. Sci. 38:1989;178.
8. Stutius W., Streifer W. Appl. Opt. 16:1977;3218.
9. Gleine W., Muller J. IEEE J. Lightwave Tech. 9:1991;1626.
10. Johnson C., Wydeven T., Donohoe K. Sol. En. 31:1983;355.
11. Liu X., Jia Q., Liu E. Sol. En. Mater. 17:1988;257.
12. Forouhi R., Bloomer I. Phys. Rev. B34:1986;7018.
13. F. James, Proceedings of the 1972 CERN computing and data processing School, Pertisau, Austria, Sept. 1972.
14. Aspnes D.E., Studna A.A. Phys. Rev. B27:1983;985.
15. Malitson I.J. J. Opt. Soc. Am. 55:1965;1205.
16. Petalas J., Logothetidis S. Phys. Rev. B50:1994;11 801.
17. Davazoglou D. Appl. Phys. Lett. 70:1997;246.
18. Davazoglou D. Thin Solid Films. 302:1997;204.
19. Davazoglou D., Kouvatsos D.N. J. Appl. Phys. 92:2002;4470.
20. Heavens O.S. Optical Properties of Thin Solid Films. 1965;Dover, New York.
21. D.E. Aspnes in 'Properties of Silicon', EMIS data reviews series no 4, 1998, 59.
22. Rand M., Roberts J. J. Electrochem. Soc. 120:1973;446.
23. Gaind A., Hearn E. J. Electrochem. Soc. 125:1978;139.
24. Baak T. Appl. Opt. 21:1982;1069.
25. D. Davazoglou, V. Em. Vamvakas, CIMTEC 2002 Proceedings of the 10th International Ceramics Congress and 3rd Forum of New Materials, Part C-vol. 3, 271.
26. N.F. Mott, A. Davis 'Electronic Processes in Non-Crystalline Materials' (Clarenton, Oxford 1979).
27. D. Davazoglou, A. Iliadis in: D. Jones, A. Mascarhenas, P. Petroff, R. Bhat, (Eds.), Materials-Ordering, Composition, Modulation and Self-assembled Structures Proceedings of the MRS 417 (1996) 417.
28. Xu Y.-N., Ching W.Y. Phys. Rev. B. 51:1995;17 379.
29. Karcher R., Ley L., Johnson R.L. Phys. Rev. B30:1984;1896.