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Chemistry of Materials

Volumn 14, Issue 1, 2002, Pages 144-153

UV laser photolysis of disiloxanes for chemical vapor deposition of nano-textured silicones

(7) Pola, Josef a Galíková, Anna a Galík, Aftanas a Blechta, Vratislav a Bastl, Zdeněk b Šubrt, Jan c Ouchi, Akihiko d

a INSTITUTE OF CHEMICAL PROCESS FUNDAMENTALS (Czech Republic)

b J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY (Czech Republic)

c INSTITUTE OF INORGANIC CHEMISTRY (Czech Republic)

d NATL INST OF MAT AND CHEM RES (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

SILICONE DERIVATIVE; SILOXANE;

ARTICLE; CHEMICAL REACTION; LASER; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PHOTOLYSIS; REACTION ANALYSIS; THERMOSTABILITY; ULTRAVIOLET IRRADIATION; VAPOR;

EID: 0036124275 PISSN: 08974756 EISSN: None Source Type: Journal
DOI: 10.1021/cm011109o Document Type: Article

Times cited : (29)

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