Formation of hydrogenated Si2O films by UV laser photolysis of disiloxane

Journal of Materials Chemistry

Volumn 9, Issue 10, 1999, Pages 2429-2431

  Pola, Josef ^a,b   Urbanova, Markéta ^a,b   Bastl, Zdenek ^a,b   Šubr, Jan ^a,b   Beckers, Helmut ^a,b  

^a INSTITUTE OF CHEMICAL PROCESS FUNDAMENTALS   (Czech Republic)

^b J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

DISILOXANE; SILICON DERIVATIVE; SILICON DIOXIDE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL BINDING; DRUG PURITY; HYDROGENATION; INFRARED SPECTROSCOPY; LASER; PHOTOLYSIS; ULTRAVIOLET RADIATION; X RAY SPECTROMETRY;

EID: 0032705251     PISSN: 09599428     EISSN: None     Source Type: Journal    
DOI: 10.1039/a903998h     Document Type: Article

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