Influence of process variables on electron beam chemical vapor deposition of platinum

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 5, 2005, Pages 2151-2159

  Beaulieu, D ^a   Ding, Yong ^b   Wang, Z L ^b   Lackey, W J ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^b Georgia Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM CURRENT; DEPOSITION TIME; GROWTH RATES;

CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELECTRON BEAMS; OPTIMIZATION; SCANNING ELECTRON MICROSCOPY;

PLATINUM;

EID: 31144468886     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2050672     Document Type: Article

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