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Volumn 30, Issue 12, 2005, Pages 937-938
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Fabrication of sub-45-nm structures for the next generation of devices: A lot of effort for a little device
[No Author Info available]
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Author keywords
Lithography; Nanoelectromechanical systems; Self assembly; Supercritical fluids
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Indexed keywords
CATALYSIS;
ELECTRONIC EQUIPMENT;
ENERGY CONVERSION;
FLUIDS;
FUNCTIONS;
OPTICS;
SELF ASSEMBLY;
SENSORS;
SUPERCRITICAL FLUIDS;
NANOELECTROMECHANICAL SYSTEMS;
SENSOR TECHNOLOGY;
THREE-DIMENSIONAL STRUCTURES;
NANOSTRUCTURED MATERIALS;
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EID: 33744824907
PISSN: 08837694
EISSN: None
Source Type: Journal
DOI: 10.1557/mrs2005.246 Document Type: Article |
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Times cited : (8)
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References (1)
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