Sputtered rutile stoichiometric TiO2 nanocrystalline films

Journal of Materials Science: Materials in Electronics

Volumn 17, Issue 10, 2006, Pages 851-855

  Vale, A ^a   Chaure, N ^b   Simonds, M ^a   Ray, A K ^c   Bricklebank, N ^a  

^a SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

^b TRINITY COLLEGE DUBLIN   (Ireland)

^c QUEEN MARY UNIVERSITY OF LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY GAP; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; STOICHIOMETRY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

NANOCRYSTALLINE FILMS; OPTICAL BAND GAP; RUTILE PHASE;

TITANIUM DIOXIDE;

EID: 33748703301     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-006-0034-z     Document Type: Article

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