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Volumn 343-344, Issue 1-2, 1999, Pages 152-155

Reactively sputtered TiO2-x thin films with plasma-emission-controlled departure from stoichiometry

Author keywords

Anatase; Optical properties; Rutile; Sputtering; Titanium dioxide

Indexed keywords

DIFFRACTION GRATINGS; LIGHT ABSORPTION; MAGNETRON SPUTTERING; REFRACTIVE INDEX; SPECTROPHOTOMETRY; STOICHIOMETRY; THIN FILMS; TITANIUM DIOXIDE;

ANATASE-RUTILE MIXTURES; GRAZING INCIDENCE DIFFRACTION (GID); PLASMA-EMISSION-CONTROLLED DEPARTURES;

OPTICAL FILMS;

EID: 0032650699 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(98)01651-4 Document Type: Article

Times cited : (34)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.